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Author:

高志远 (高志远.) | 张洁 (张洁.) | 薛晓玮 (薛晓玮.) | 赵立欢 (赵立欢.) | 邹德恕 (邹德恕.)

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incoPat zhihuiya

Abstract:

一种控制横向ZnO纳米线阵列紫外探测器均匀性的方法,涉及纳米技术与紫外探测技术领域。本发明利用水热法技术,基于二氧化硅衬底、种子层、台阶之间的相互作用,通过依次调整二氧化硅衬底种类、台阶处坡度、种子层厚度、溶液生长浓度和生长时间等实验参数得到高均匀性横向ZnO纳米线阵列的紫外探测器。本发明简单有效,提高了探测器均匀性和稳定性。

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Patent Info :

Type: 发明授权

Patent No.: CN201710317590.4

Filing Date: 2017-05-08

Publication Date: 2018-11-30

Pub. No.: CN107123701B

Applicants: 北京工业大学

Legal Status: 授权

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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