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Abstract:
Additive manufacturing as a new manufacturing technology has significant advantages in producing complex impeller parts, but the surface roughness limits its wide application. Therefore, the work aims to solve the problem of excessive surface roughness of TC4 titanium alloy (Ti6Al4V) impeller parts produced by additive manufacturing. In order to improve the surface roughness of through-hole or complex outer surface parts caused by powder adhesion and spheroidization defects, abrasive flow polishing technology was applied to polish the surface of TC4 titanium alloy specimens. The effect of abrasive flow polishing on the surface roughness and morphology of TC4 titanium alloy was studied under different abrasive particle size, working pressure and processing time. The polishing process of abrasive was simulated by Fluent software to explore the mechanism of abrasive particles on the static pressure, dynamic pressure, turbulent kinetic energy and turbulence intensity near the wall. A three-dimensional impeller model was built and the actual processing conditions were taken as simulation parameters to verify the effectiveness of abrasive flow polishing method. At the same time, wear resistance of the TC4 titanium alloy before and after abrasive flow polishing were tested and analyzed. The TC4 titanium alloy specimens produced by additive manufacturing were cut into 40 mm×40 mm×5 mm by wire cutting, cleaned and dried. The SMK-600 abrasive flow polishing machine was used to optimize the surface roughness of titanium alloy specimens by cutting the workpiece surface through the reciprocating movement of abrasive media. The solid particles of abrasive medium were SiC abrasive particles, and the mixture of methyl silicone oil and polyacrylamide was used as liquid medium. Experiments verified that titanium alloy parts with surface roughness Ra © 2023 Chongqing Wujiu Periodicals Press. All rights reserved.
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Source :
Surface Technology
Year: 2023
Issue: 3
Volume: 52
Page: 287-298
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count: 2
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 7
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