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Author:

Liu, Shanshan (Liu, Shanshan.) | Yu, Jie-Xiang (Yu, Jie-Xiang.) | Zhang, Enze (Zhang, Enze.) | Li, Zihan (Li, Zihan.) | Sun, Qiang (Sun, Qiang.) | Zhang, Yong (Zhang, Yong.) | Cao, Liwei (Cao, Liwei.) | Li, Lun (Li, Lun.) | Zhao, Minhao (Zhao, Minhao.) | Leng, Pengliang (Leng, Pengliang.) | Cao, Xiangyu (Cao, Xiangyu.) | Li, Ang (Li, Ang.) | Zou, Jin (Zou, Jin.) | Kou, Xufeng (Kou, Xufeng.) | Zang, Jiadong (Zang, Jiadong.) | Xiu, Faxian (Xiu, Faxian.)

Indexed by:

EI Scopus SCIE

Abstract:

The anomalous Hall effect (AHE) is an important transport signature revealing topological properties of magnetic materials and their spin textures. Recently, MnBi2Te4 has been demonstrated to be an intrinsic magnetic topological insulator. However, the origin of its intriguing AHE behaviors remains elusive. Here, we demonstrate the Berry curvature-dominated intrinsic AHE in wafer-scale MnBi2Te4 films. By applying back-gate voltages, we observe an ambipolar conduction and n-p transition in similar to 7-layer MnBi2Te4, where a quadratic relation between the AHE resistance and longitudinal resistance suggests its intrinsic AHE nature. In particular, for similar to 3-layer MnBi2Te4, the AHE sign can be tuned from pristine negative to positive. First-principles calculations unveil that such an AHE reversal originated from the competing Berry curvature between oppositely polarized spin-minority-dominated surface states and spin-majority-dominated inner bands. Our results shed light on the underlying physical mechanism of the intrinsic AHE and provide new perspectives for the unconventional sign-tunable AHE.

Keyword:

MnBi2Te4 thin film magnetic topological insulator anomalous Halleffect gate-tunable AHE sign reversal

Author Community:

  • [ 1 ] [Liu, Shanshan]Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
  • [ 2 ] [Zhang, Enze]Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
  • [ 3 ] [Li, Zihan]Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
  • [ 4 ] [Zhao, Minhao]Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
  • [ 5 ] [Leng, Pengliang]Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
  • [ 6 ] [Cao, Xiangyu]Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
  • [ 7 ] [Xiu, Faxian]Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
  • [ 8 ] [Liu, Shanshan]Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
  • [ 9 ] [Zhang, Enze]Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
  • [ 10 ] [Li, Zihan]Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
  • [ 11 ] [Zhao, Minhao]Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
  • [ 12 ] [Leng, Pengliang]Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
  • [ 13 ] [Cao, Xiangyu]Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
  • [ 14 ] [Xiu, Faxian]Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
  • [ 15 ] [Liu, Shanshan]Shanghai Qi Zhi Inst, Shanghai 200232, Peoples R China
  • [ 16 ] [Li, Zihan]Shanghai Qi Zhi Inst, Shanghai 200232, Peoples R China
  • [ 17 ] [Zhao, Minhao]Shanghai Qi Zhi Inst, Shanghai 200232, Peoples R China
  • [ 18 ] [Leng, Pengliang]Shanghai Qi Zhi Inst, Shanghai 200232, Peoples R China
  • [ 19 ] [Cao, Xiangyu]Shanghai Qi Zhi Inst, Shanghai 200232, Peoples R China
  • [ 20 ] [Xiu, Faxian]Shanghai Qi Zhi Inst, Shanghai 200232, Peoples R China
  • [ 21 ] [Yu, Jie-Xiang]Soochow Univ, Sch Phys Sci & Technol, Suzhou 215006, Peoples R China
  • [ 22 ] [Sun, Qiang]Univ Queensland, Mat Engn, Brisbane, Qld 4072, Australia
  • [ 23 ] [Zou, Jin]Univ Queensland, Mat Engn, Brisbane, Qld 4072, Australia
  • [ 24 ] [Sun, Qiang]Univ Queensland, Ctr Microscopy & Microanal, Brisbane, Qld 4072, Australia
  • [ 25 ] [Zou, Jin]Univ Queensland, Ctr Microscopy & Microanal, Brisbane, Qld 4072, Australia
  • [ 26 ] [Zhang, Yong]ShanghaiTech Univ, Sch Informat Sci & Technol, Shanghai 201210, Peoples R China
  • [ 27 ] [Li, Lun]ShanghaiTech Univ, Sch Informat Sci & Technol, Shanghai 201210, Peoples R China
  • [ 28 ] [Kou, Xufeng]ShanghaiTech Univ, Sch Informat Sci & Technol, Shanghai 201210, Peoples R China
  • [ 29 ] [Cao, Liwei]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing Key Lab Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 30 ] [Li, Ang]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing Key Lab Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 31 ] [Zang, Jiadong]Univ New Hampshire, Dept Phys & Astron, Durham, NH 03824 USA
  • [ 32 ] [Xiu, Faxian]Fudan Univ, Inst Nanoelect Devices & Quantum Comp, Shanghai 200433, Peoples R China
  • [ 33 ] [Xiu, Faxian]Fudan Univ, Zhangjiang Fudan Int Innovat Ctr, Shanghai 201210, Peoples R China
  • [ 34 ] [Xiu, Faxian]Shanghai Res Ctr Quantum Sci, Shanghai 201315, Peoples R China

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Source :

NANO LETTERS

ISSN: 1530-6984

Year: 2023

Issue: 1

Volume: 24

Page: 16-25

1 0 . 8 0 0

JCR@2022

Cited Count:

WoS CC Cited Count: 8

SCOPUS Cited Count: 7

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

Affiliated Colleges:

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