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Author:

Zhang, Ping (Zhang, Ping.) | Zhou, Yurong (Zhou, Yurong.) | Yan, Qingbo (Yan, Qingbo.) | Liu, Fengzhen (Liu, Fengzhen.) | Li, Jingwen (Li, Jingwen.) (Scholars:李京文) | Dong, Gangqiang (Dong, Gangqiang.)

Indexed by:

EI Scopus CSCD

Abstract:

Highly-oriented Cu2O thin films were prepared by low temperature thermal oxidation of evaporated Cu thin films. The films were doped with different doses of nitrogen by ion implantation. An absorption peak appears below the absorption edge in the absorption spectrum of highly nitrogen doped Cu2O. The effect of nitrogen doping on the crystal structure, electronic structure and optical properties of Cu2O were investigated systematically by first-principles calculations. The calculation results indicate that an intermediate energy band exists in the forbidden gap of highly nitrogen doped Cu2O. The electron transition from the valence band to the intermediate band is consistent with the absorption peak by experimental observation. Experimental and computational results indicate that nitrogen doped Cu2O could be a suitable absorbing material candidate for wide-spectrum detectors or intermediate band solar cells. © 2014 Chinese Institute of Electronics.

Keyword:

Electronic structure Electron transitions Ion implantation Absorption spectroscopy Optical properties Thin films Calculations Solar cells Semiconductor doping Temperature Crystal structure Nitrogen Copper

Author Community:

  • [ 1 ] [Zhang, Ping]University of Chinese Academy of Sciences, Beijing, China
  • [ 2 ] [Zhou, Yurong]University of Chinese Academy of Sciences, Beijing, China
  • [ 3 ] [Yan, Qingbo]University of Chinese Academy of Sciences, Beijing, China
  • [ 4 ] [Liu, Fengzhen]University of Chinese Academy of Sciences, Beijing, China
  • [ 5 ] [Li, Jingwen]Beijing University of Technology, Beijing, China
  • [ 6 ] [Dong, Gangqiang]University of Chinese Academy of Sciences, Beijing, China

Reprint Author's Address:

  • [zhou, yurong]university of chinese academy of sciences, beijing, china

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Source :

Journal of Semiconductors

ISSN: 1674-4926

Year: 2014

Issue: 10

Volume: 35

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 6

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 7

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