The　low　efficiency　of　femtosecond　laser　processing　and　the　ordinary　antireflection　performance　are　still　huge　obstacles　that　dramatically　inhibit　the　practical　application　of　femtosecond　laser　antireflection　technology.　Inspired　from　the　moth　eye,　this　paper　aims　to　propose　a　novel　and　highly　efficient　method　to　fabricate　the　broadband　ultralow　reflectance　biomimetic　structures　silicon　via　femtosecond　laser　inducing　and　chemical　etching.　Different　from　the　traditional　micro　size　focus　spot　of　femtosecond　laser,　a　beam　shaping　strategy　is　used　to　generate　centimeter　scale　line　beam　to　fabricate　hierarchical　structures　on　silicon　surface,　which　dramatically　increases　the　manufacturing　efficiency.　Then,　based　on　the　structural　differences　induced　by　line　beam,　a　screen　block　strategy　and　a　chemical　etching　method　are　involved　to　selectively　fabricate　antireflective　biomimetic　micro　pillars　in　a　large　area.　Accordingly,　the　reflectance　of　biomimetic　structures　is　lower　than　0.2　%　in　the　wavelength　of　300　nm-2500　nm,　and　the　omnidirectional　reflectance　is　lower　than　0.6　%　and　1.4　%　for　S　polarization　and　P　polarization　light　at　different　incident　angles　(20　degrees-80　degrees),　respectively.　Additionally,　it　only　takes　＜35　min　to　fabricate　biomimetic　structures　of　24.8　x　24.8　mm(2)　on　Si　surface　with　such　outstanding　antireflection　performance,　which　is　highly　efficient.