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Author:

Liang, Wen-Jun (Liang, Wen-Jun.) (Scholars:梁文俊) | Li, Jian (Li, Jian.) | Li, Jing-Xin (Li, Jing-Xin.) | Zheng, Feng (Zheng, Feng.) | Jin, Yu-Quan (Jin, Yu-Quan.)

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EI Scopus PKU CSCD

Abstract:

Spontaneous polarization plasma reactor was used to remove toluene, which was a representative volatile organic compounds. Under the condition of commercial-frequency and high-frequency discharge, the traits of the VOCs abatement among the BaTiO3 reactor, the NaNO2 reactor and an empty reactor were investigated. The running power and pressure drop of the three kinds of reactor were also compared. Decomposition products and reaction mechanism of toluene were analyzed at the same time. The experimental results show that under the same conditions, the reactor with filling has higher removal efficiency than the reactor without filling. Furthermore, the reactor with barium titanate filling had higher removal efficiency than the reactor with sodium nitrite filling. The running power and pressure drop of the reactor with filling are higher than that of the empty reactor. Except a small amount of toluene no other side-products are detected in the effluent.

Keyword:

Pressure drop Polarization Volatile organic compounds Effluents Plasmas Efficiency Filling Toluene Drops Plasma applications Electric discharges Barium titanate Sodium compounds

Author Community:

  • [ 1 ] [Liang, Wen-Jun]College of Environmental and Energy Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 2 ] [Li, Jian]College of Environmental and Energy Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 3 ] [Li, Jing-Xin]College of Environmental and Energy Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 4 ] [Zheng, Feng]College of Environmental and Energy Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 5 ] [Jin, Yu-Quan]College of Environmental and Energy Engineering, Beijing University of Technology, Beijing 100124, China

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Source :

Journal of Beijing University of Technology

ISSN: 0254-0037

Year: 2010

Issue: 11

Volume: 36

Page: 1579-1584

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 10

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