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Author:

Wang, Cong-Zeng (Wang, Cong-Zeng.) | Su, Xue-Kuan (Su, Xue-Kuan.) | Zhang, Lian-Bao (Zhang, Lian-Bao.) | Ma, Jie (Ma, Jie.) | Gao, Fan (Gao, Fan.) | Peng, Zhen (Peng, Zhen.)

Indexed by:

EI Scopus PKU CSCD

Abstract:

For a better application of Hollow Cathode Discharge (HCD) to powder metallurgy sintering, with the pressed stainless powder cylinder and parallelism sheet bar as hollow cathodes, the igniting conditions of HCD and the effects of vacuum width, air pressure, voltage and temperature of hollow cathode have been studied in this paper. The results show that the igniting condition of HCD is the felicitousness combination of vacuum width, air pressure and voltage. The current density of discharge is related to the vacuum width, voltage and air pressure. Under the condition of meeting the requirements of HCD effect, the smaller the vacuum width, the higher the pressure of work gas and the discharge voltage is, and the larger the current density of discharge is. The current density reduces along with the temperature of hollow cathode rise.

Keyword:

Temperature Pressure Current density Powder metallurgy Electric potential Cathodes Sintering

Author Community:

  • [ 1 ] [Wang, Cong-Zeng]College of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 2 ] [Su, Xue-Kuan]College of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 3 ] [Zhang, Lian-Bao]College of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 4 ] [Ma, Jie]College of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 5 ] [Gao, Fan]College of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 6 ] [Peng, Zhen]College of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China

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Source :

Journal of Beijing University of Technology

ISSN: 0254-0037

Year: 2006

Issue: 12

Volume: 32

Page: 1134-1137

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 7

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