Using　WF6　and　H2　as　precursors,　many　kinds　of　dense　shaped　tungsten　products　were　successfully　developed　by　chemical　vapor　deposition.　The　results　show　that　the　deposit　is　of　high　purity　(＞99.8%)　and　high　density　(＞19.2　g/cm3).　The　microstructure　of　deposit　is　columnar　crystal　with　preferential　growth　in　the　direction　of　(200).　The　deposition　rate　can　be　2-3　mm/h.　The　application　of　chemical　vapor　deposition　method　in　preparing　shaped　tungsten　product　possesses　a　bright　future　due　to　simple　equipment,　reliable　process　and　the　product　of　high　quality.