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Author:

Liu, Shenghao (Liu, Shenghao.) | Xie, Xuesong (Xie, Xuesong.) | Zhang, Xiaoling (Zhang, Xiaoling.) | Zhu, Wenju (Zhu, Wenju.)

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EI

Abstract:

In this paper, the behavior of thermal instability in power MOSFET is investigated. It is shown that the device is at risk of thermal instability when the current has a positive temperature coefficient. The MOSFET current has a positive temperature coefficient when gate voltage is less than temperature compensation point. The model and experimental data show that the sufficient condition for the thermal instability in the device is S>1. The drain voltage has a large effect on the thermal instability of the device, and the device with a large transconductance has poor thermal stability. Finally, the thermal images demonstrate that even at a steady-state temperature field, there is no uniform temperature and current on the surface of the chip, and the difference is greater in the unstable region. The results confirm that the burnout of chip is caused by local hot spot. © 2019 IEEE.

Keyword:

Positive temperature coefficient Power MOSFET Thermodynamic stability Temperature Stability

Author Community:

  • [ 1 ] [Liu, Shenghao]Beijing University of Technology, Beijing, China
  • [ 2 ] [Xie, Xuesong]Beijing University of Technology, Beijing, China
  • [ 3 ] [Zhang, Xiaoling]Beijing University of Technology, Beijing, China
  • [ 4 ] [Zhu, Wenju]Beijing University of Technology, Beijing, China

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Source :

Year: 2019

Page: 541-545

Language: English

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 3

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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