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Author:

Hu, Dongqing (Hu, Dongqing.) | Luo, Xiaokang (Luo, Xiaokang.) | Zhou, Xintian (Zhou, Xintian.)

Indexed by:

EI

Abstract:

Depletion-mode gallium nitride (GaN) high-electron-mobility transistors (HEMTs) need to connect with an enhancement-mode silicon (Si) MOSFET for cascoded structures in order to achieve normally-off operation. The devices are submitted to electrical overstress to investigate the degradation phenomenon. The results demonstrate that degradation near the rated voltage of enhancement-mode GaN (e-GaN) Cascoded FETs can be a time-dependent process. There is no significant degradation of on-resistance and saturation current after a period of time for devices experienced 320V stress. The electrical characteristics of the devices are measured after 6 days of natural recovery. The on-resistance and saturation current of all devices exhibit reversibility, while the gate/source leakage current is irreversible. © 2019 IEEE.

Keyword:

Nitrides Analog circuits High electron mobility transistors III-V semiconductors Gallium nitride

Author Community:

  • [ 1 ] [Hu, Dongqing]Beijing University of Technology, Beijing, China
  • [ 2 ] [Luo, Xiaokang]Beijing University of Technology, Beijing, China
  • [ 3 ] [Zhou, Xintian]Beijing University of Technology, Beijing, China

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Source :

Year: 2019

Page: 157-160

Language: English

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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