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Author:

Chen, Yichuan (Chen, Yichuan.) | Hu, Yuehui (Hu, Yuehui.) | Meng, Qi (Meng, Qi.) | Yan, Hui (Yan, Hui.) (Scholars:严辉) | Shuai, Weiqiang (Shuai, Weiqiang.) | Zhang, Zhiming (Zhang, Zhiming.)

Indexed by:

EI Scopus SCIE

Abstract:

In this work, the natively textured surface of gallium-doped zinc oxide (GZO) films were obtained onto quartz substrates by radio frequency magnetron sputtering. The optimal optoelectronic properties of GZO thin film exhibited the lowest resistivity 6.8x10(-4)cm, where the carrier concentration and carrier mobility were 5.3x10(20)cm(-3) and 17.3cm(2)V(-1)s(-1), respectively, and the transmittance above 87% in the range of 0.4-1.2 mu m. Meanwhile, this GZO thin film had a low surface work function of 3.9eV. We used a two-steps spin-coating method to deposit the perovskite films. The optical band gap of this perovskite films is 1.561eV. The planar perovskite solar cells device modeling based on GZO electron transporting layer was performed by the Solar Cell Capacitance Simulator program. We inputted the electrical and optical parameters of GZO thin film in our perovskite solar cells simulation model. With the increasing of carrier concentration, a high-power conversion efficiency of 20.167% was obtained. Modifying GZO surface, obtaining a suitable surface work function (3.9eV), it could reduce the interlayer contact barrier and optimize the energy level matching. At the perovskite/electron transporting layer interface, no electron barrier was formed, which facilitated electron extraction and reduced interface recombination. The higher power conversion efficiency of 21.132% was obtained.

Keyword:

Author Community:

  • [ 1 ] [Chen, Yichuan]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Meng, Qi]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Yan, Hui]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Chen, Yichuan]Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China
  • [ 5 ] [Hu, Yuehui]Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China
  • [ 6 ] [Shuai, Weiqiang]Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China
  • [ 7 ] [Zhang, Zhiming]Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China

Reprint Author's Address:

  • 严辉

    [Chen, Yichuan]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China;;[Yan, Hui]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China;;[Chen, Yichuan]Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China;;[Hu, Yuehui]Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China

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Source :

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

ISSN: 0957-4522

Year: 2019

Issue: 5

Volume: 30

Page: 4726-4736

2 . 8 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:211

JCR Journal Grade:2

Cited Count:

WoS CC Cited Count: 18

SCOPUS Cited Count: 15

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 10

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