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Author:

Wei, L. (Wei, L..) | Mei, W. (Mei, W..) | Hao, W. (Hao, W..) | Bo, W. (Bo, W..) | Hui, Y. (Hui, Y..) | Bo, L. (Bo, L..) | Jingjing, W. (Jingjing, W..)

Indexed by:

Scopus PKU CSCD

Abstract:

β-SiC thin films were grown on Si(100) using PECVD at 400°C-700°C. The structure and composition of the samples were analyzed by FTIR and XRD. The influences of substrate temperature on the crystalline degree of SiC thin films in certain deposit conditions were discussed and the thin films with perfect crystalline degree at 600 °C were obtained.

Keyword:

β-sic; PECVD; Sic thin films's

Author Community:

  • [ 1 ] [Wei, L.]Beijing Polytechnic University School, Beijing 100022, China
  • [ 2 ] [Mei, W.]Beijing Polytechnic University School, Beijing 100022, China
  • [ 3 ] [Hao, W.]Beijing Polytechnic University School, Beijing 100022, China
  • [ 4 ] [Bo, W.]Beijing Polytechnic University School, Beijing 100022, China
  • [ 5 ] [Hui, Y.]Beijing Institute of Technology Department, Beijing 100081, China
  • [ 6 ] [Bo, L.]Beijing Institute of Technology Department, Beijing 100081, China
  • [ 7 ] [Jingjing, W.]Beijing Institute of Technology Department, Beijing 100081, China

Reprint Author's Address:

  • [Wei, L.]Beijing Polytechnic University School, Beijing 100022, China

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Source :

Rare Metal Materials and Engineering

ISSN: 1002-185X

Year: 2001

Issue: SUPPL. 1

Volume: 30

Page: 478-

0 . 7 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

JCR Journal Grade:3

Cited Count:

WoS CC Cited Count: 4

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 16

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