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Author:

Zhao, Shaofan (Zhao, Shaofan.) | Wang, Haibin (Wang, Haibin.) | Xiao, Lin (Xiao, Lin.) | Guo, Nan (Guo, Nan.) | Zhao, Delin (Zhao, Delin.) | Yao, Kefu (Yao, Kefu.) | Chen, Na (Chen, Na.)

Indexed by:

EI Scopus SCIE

Abstract:

Quinary Ti-Zr-Hf-Cu-Ni high-entropy metallic glass thin films were produced by magnetron sputter deposition. Nanoindentation tests indicate that the deposited film exhibits a relatively large hardness of 10.4 +/- 0.6 GPa and a high elastic modulus of 131 +/- 11 GPa under the strain rate of 0.5 s(-1). Specifically, the strain rate sensitivity of hardness measured for the thin film is 0.05, the highest value reported for metallic glasses so far. Such high strain rate sensitivity of hardness is likely due to the high-entropy effect which stabilizes the amorphous structure with enhanced homogeneity.

Keyword:

Thin films High-entropy metallic glasses Nanoindentation Strain rate sensitivity

Author Community:

  • [ 1 ] [Zhao, Shaofan]Qian Xuesen Lab Space Technol, Beijing 100094, Peoples R China
  • [ 2 ] [Xiao, Lin]Qian Xuesen Lab Space Technol, Beijing 100094, Peoples R China
  • [ 3 ] [Guo, Nan]Qian Xuesen Lab Space Technol, Beijing 100094, Peoples R China
  • [ 4 ] [Wang, Haibin]Beijing Univ Technol, Educ Minist China, Key Lab Adv Funct Mat, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Zhao, Delin]Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat Proc Technol, Beijing 100084, Peoples R China
  • [ 6 ] [Yao, Kefu]Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat Proc Technol, Beijing 100084, Peoples R China
  • [ 7 ] [Chen, Na]Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat Proc Technol, Beijing 100084, Peoples R China

Reprint Author's Address:

  • [Zhao, Shaofan]Qian Xuesen Lab Space Technol, Beijing 100094, Peoples R China;;[Chen, Na]Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat Proc Technol, Beijing 100084, Peoples R China

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Source :

PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES

ISSN: 1386-9477

Year: 2017

Volume: 94

Page: 100-105

3 . 3 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:158

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 31

SCOPUS Cited Count: 35

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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