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Author:

Wang, B. (Wang, B..) (Scholars:王波) | Wang, R.Z. (Wang, R.Z..) (Scholars:王如志) | Zhou, H. (Zhou, H..) | Yan, X.H. (Yan, X.H..) | Cao, J.X. (Cao, J.X..) | Wang, H. (Wang, H..) | Yan, H. (Yan, H..)

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Scopus

Abstract:

An electron-emission theoretical model integrating the change in the grain size of nanocrystalline cubic boron nitride (c-BN) thin films was established. To understand better the essence of field emission, an accurate numerical scheme, the transfer matrix method, that can be used to compute the tunneling coefficients of the actual surface barrier, was also adopted. The present results show that the emission current from nanocrystalline grain films is far larger than that from regular grain films or bulk c-BN. © 2003 Elsevier Ltd. All rights reserved.

Keyword:

Cubic boron nitride; Field emission

Author Community:

  • [ 1 ] [Wang, B.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China
  • [ 2 ] [Wang, R.Z.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China
  • [ 3 ] [Zhou, H.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China
  • [ 4 ] [Yan, X.H.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China
  • [ 5 ] [Yan, X.H.]Department of Physics, Xiangtan University, Xiangtan 411105, Hunan, China
  • [ 6 ] [Cao, J.X.]Department of Physics, Xiangtan University, Xiangtan 411105, Hunan, China
  • [ 7 ] [Wang, H.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China
  • [ 8 ] [Yan, H.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China

Reprint Author's Address:

  • [Yan, H.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China

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Source :

Microelectronics Journal

ISSN: 0026-2692

Year: 2004

Issue: 4

Volume: 35

Page: 371-374

Language: English

2 . 2 0 0

JCR@2022

ESI Discipline: ENGINEERING;

JCR Journal Grade:3

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 3

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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