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< Page ,Total 32 >
Advanced thermal boundary resistance measurement techniques for thick-film diamond heterostructures SCIE
期刊论文 | 2025 , 126 (1) | APPLIED PHYSICS LETTERS
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Abstract :

With the miniaturization of electronic devices, thermal management has become a critical challenge, especially for high-power systems where efficient heat dissipation is essential. Polycrystalline diamond films, renowned for their exceptional thermal conductivity, offer a promising solution. However, the thermal boundary resistance (TBR) at the diamond/substrate interface remains a significant bottleneck, severely impacting heat dissipation efficiency. This study presents a measurement approach tailored for quantifying TBR in thick-film diamond heterostructures, focusing on diamond-on-silicon (Diamond-on-Si) systems with a silicon nitride barrier layer. Compared to conventional methods, such as transient thermoreflectance techniques, which often exhibit limited sensitivity for thick layers, this approach demonstrates greater reliability and applicability. The findings establish a foundation for advancing strategies to reduce TBR and improve the thermal management performance of diamond films in high-power electronic applications.

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GB/T 7714 Lu, Xiaozhuang , Liu, Qingbin , Yu, Cui et al. Advanced thermal boundary resistance measurement techniques for thick-film diamond heterostructures [J]. | APPLIED PHYSICS LETTERS , 2025 , 126 (1) .
MLA Lu, Xiaozhuang et al. "Advanced thermal boundary resistance measurement techniques for thick-film diamond heterostructures" . | APPLIED PHYSICS LETTERS 126 . 1 (2025) .
APA Lu, Xiaozhuang , Liu, Qingbin , Yu, Cui , Feng, Shiwei , Feng, Zhihong , Li, Haibing et al. Advanced thermal boundary resistance measurement techniques for thick-film diamond heterostructures . | APPLIED PHYSICS LETTERS , 2025 , 126 (1) .
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A Trap Characterization System for GaN HEMTs Based on Transient Drain Voltage SCIE
期刊论文 | 2024 , 73 | IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT
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Abstract :

In this article, a trap characterization system based on the transient drain voltage was constructed to achieve the complete measurement and analysis of traps in GaN high-electron-mobility transistors (HEMTs). Through the appropriate design of the measurement circuit and acquisition system, the transient drain voltage variations caused by trapping behaviors in the GaN HEMTs can be obtained. A time constant extraction method based on the Bayesian deconvolution function was used to optimize the trap extraction accuracy, and the trap properties, including time constant, absolute amplitudes, and energy levels, can be comprehensively characterized. In combination with the above trap features, the response of trapping behaviors to various bias voltages was obtained to analyze the trap positions. With respect to the GaN HEMTs with different processes and fabrications, extensive measurements of energy levels were performed on four kinds of samples to confirm the validity of the proposed characterization system, and four devices of each kind were used to verify the repeatability of experimental results. It indicated that the constructed instrument and measurement methods can realize the accurate and nondestructive characterization of traps. The method used in this study can be potentially beneficial to better understand the reliability issues and optimize the performance of devices.

Keyword :

GaN high-electron-mobility transistors (HEMTs) GaN high-electron-mobility transistors (HEMTs) Energy level Energy level trapping effect trapping effect reliability reliability transient drain voltage transient drain voltage

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GB/T 7714 Pan, Shijie , Feng, Shiwei , Li, Xuan et al. A Trap Characterization System for GaN HEMTs Based on Transient Drain Voltage [J]. | IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT , 2024 , 73 .
MLA Pan, Shijie et al. "A Trap Characterization System for GaN HEMTs Based on Transient Drain Voltage" . | IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT 73 (2024) .
APA Pan, Shijie , Feng, Shiwei , Li, Xuan , Bai, Kun , Lu, Xiaozhuang , Zheng, Xiang et al. A Trap Characterization System for GaN HEMTs Based on Transient Drain Voltage . | IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT , 2024 , 73 .
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Automatic in-situ measurement of thermal resistance for GaN HEMTs SCIE
期刊论文 | 2024 , 149 | MICROELECTRONICS JOURNAL
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Abstract :

An automatic in -situ technique for thermal resistance measurement based on an electrical method is proposed in this paper. In contrast to the conventional thermal resistance measurement circuits of the electrical method, this method involves direct measurement of the thermal resistance of GaN high-electron-mobility transistor (HEMT) devices in an operating circuit by introducing a well-matched radio-frequency switching circuit into the operating circuit. The advantage of this method is that the thermal resistance can be measured periodically on the insitu device without changing the electrical characteristics of the device. Based on this result, the cooling curve of the HEMT device in the power amplifier (PA) circuit is collected and the thermal resistance characteristics of the HEMT are determined via the structure function method. The purpose of this paper is to successfully obtain the thermal resistance of in -situ devices through an automatic in -situ measurement circuit of thermal resistance, and to verify the feasibility of periodic detection of thermal resistance of in -situ devices.

Keyword :

In -situ measurement In -situ measurement GaN HEMT GaN HEMT RF switching RF switching Thermal resistance Thermal resistance S-parameters S-parameters

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GB/T 7714 Yao, Zhanwu , Feng, Shiwei , Li, Xuan et al. Automatic in-situ measurement of thermal resistance for GaN HEMTs [J]. | MICROELECTRONICS JOURNAL , 2024 , 149 .
MLA Yao, Zhanwu et al. "Automatic in-situ measurement of thermal resistance for GaN HEMTs" . | MICROELECTRONICS JOURNAL 149 (2024) .
APA Yao, Zhanwu , Feng, Shiwei , Li, Xuan , Bai, Kun , Lu, Xiaozhuang , You, Binyu et al. Automatic in-situ measurement of thermal resistance for GaN HEMTs . | MICROELECTRONICS JOURNAL , 2024 , 149 .
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Power Cycling and Research on Failure Mechanism of Press-Pack IGBT based on Thermal Resistance Composition Testing CPCI-S
期刊论文 | 2024 , 15-18 | 2024 4TH INTERNATIONAL CONFERENCE ON ELECTRONIC MATERIALS AND INFORMATION ENGINEERING, EMIE 2024
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Abstract :

Press-pack insulated gate bipolar transistor (IGBT) is widely used in transmission systems due to its high reliability and short-circuit failure modes. However, there is a lack of research on the failure mechanism of elastic press-pack IGBT. For the elastic press-pack IGBT sub-module, based on the principle of electrical measurement, this paper designs a power cycling test system for power cycling test and thermal resistance measurement. Based on the structure function method, the changes of electrical properties and thermal resistance after power cycling are studied. The reliability and failure mechanism of the elastic crimp IGBT sub-module are analyzed, and the conclusion that the gate oxide layer damage is the main failure principle is obtained. The work of this paper fills the gap in the practical application of elastic press-pack IGBT.

Keyword :

reliability reliability system installation system installation failure analysis failure analysis Power cycling Power cycling press-pack IGBT press-pack IGBT

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GB/T 7714 Zhang, Boyang , Feng, Shiwei , He, Xin et al. Power Cycling and Research on Failure Mechanism of Press-Pack IGBT based on Thermal Resistance Composition Testing [J]. | 2024 4TH INTERNATIONAL CONFERENCE ON ELECTRONIC MATERIALS AND INFORMATION ENGINEERING, EMIE 2024 , 2024 : 15-18 .
MLA Zhang, Boyang et al. "Power Cycling and Research on Failure Mechanism of Press-Pack IGBT based on Thermal Resistance Composition Testing" . | 2024 4TH INTERNATIONAL CONFERENCE ON ELECTRONIC MATERIALS AND INFORMATION ENGINEERING, EMIE 2024 (2024) : 15-18 .
APA Zhang, Boyang , Feng, Shiwei , He, Xin , Bai, Kun , Lu, Xiaozhuang , Zhou, Yinqi . Power Cycling and Research on Failure Mechanism of Press-Pack IGBT based on Thermal Resistance Composition Testing . | 2024 4TH INTERNATIONAL CONFERENCE ON ELECTRONIC MATERIALS AND INFORMATION ENGINEERING, EMIE 2024 , 2024 , 15-18 .
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Effects of 1 MeV electron radiation on the AlGaN/GaN high electron mobility transistors
期刊论文 | 2024 , 45 (9) | JOURNAL OF SEMICONDUCTORS
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Abstract :

In this study, the effects of 1 MeV electron radiation on the D-mode GaN-based high electron mobility transistors (HEMTs) were investigated after different radiation doses. The changes in electrical properties of the device were obtained, and the related physical mechanisms were analyzed. It indicated that under the radiation dose of 5 x 1014 cm-2, the channel current cannot be completely pinched off even if the negative gate voltage was lower than the threshold voltage, and the gate leakage current increased significantly. The emission microscopy and scanning electron microscopy were used to determine the damage location. Besides, the radiation dose was adjusted ranging from 5 x 1012 to 1 x 1014 cm-2, and we noticed that the drain-source current increased and the threshold voltage presented slightly negative shift. By calculations, it suggested that the carrier density and electron mobility gradually increased. It provided a reference for the development of device radiation reinforcement technology.

Keyword :

AlGaN/GaN HEMT AlGaN/GaN HEMT electron radiation electron radiation device damage device damage performance degradation performance degradation

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GB/T 7714 Pan, Shijie , Feng, Shiwei , Li, Xuan et al. Effects of 1 MeV electron radiation on the AlGaN/GaN high electron mobility transistors [J]. | JOURNAL OF SEMICONDUCTORS , 2024 , 45 (9) .
MLA Pan, Shijie et al. "Effects of 1 MeV electron radiation on the AlGaN/GaN high electron mobility transistors" . | JOURNAL OF SEMICONDUCTORS 45 . 9 (2024) .
APA Pan, Shijie , Feng, Shiwei , Li, Xuan , Feng, Zixuan , Lu, Xiaozhuang , Bai, Kun et al. Effects of 1 MeV electron radiation on the AlGaN/GaN high electron mobility transistors . | JOURNAL OF SEMICONDUCTORS , 2024 , 45 (9) .
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Research on temperatures located within facet coating layers along z-axis of semiconductor lasers SCIE
期刊论文 | 2022 , 153 | OPTICS AND LASER TECHNOLOGY
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The critical temperatures of semiconductor laser facet coating layers were studied via measurements from three prongs on the surface (coating exterior boundary), on the facet (coating interior boundary) and along the inner cavity, with temperatures measured via infrared imaging, thermoreflectance and forward-voltage methods, respectively. We subdivided the facet microstructure temperatures and demonstrated the feasibility of facet temperature measurement via thermoreflectance for the reflected light carrying the temperature information mainly comes from the coating interior boundary. Facet reflectivity transients of an AlGaInAs/AlGaAs laser diode are traced using an optical setup featuring fiber transmission and fiber detection. The highest temperature along the z-axis was measured at the facet, with a temperature rise exceeding two times that at the surface, which confirmed the significance of the subdivision, and approaching four times that in the inner cavity. Thermal transient analysis from optical and electrical methods presents similar results; steady temperature measurements as a function of injection current indicate light absorption's contribution to facet heating.

Keyword :

Thermal characteristic analysis Thermal characteristic analysis Highest temperature determination Highest temperature determination Facet coating layers Facet coating layers Nondestructive measurement Nondestructive measurement Thermoreflectance technology Thermoreflectance technology Fiber detection Fiber detection

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GB/T 7714 Ni, Yijia , Feng, Shiwei , Lu, Xiaozhuang et al. Research on temperatures located within facet coating layers along z-axis of semiconductor lasers [J]. | OPTICS AND LASER TECHNOLOGY , 2022 , 153 .
MLA Ni, Yijia et al. "Research on temperatures located within facet coating layers along z-axis of semiconductor lasers" . | OPTICS AND LASER TECHNOLOGY 153 (2022) .
APA Ni, Yijia , Feng, Shiwei , Lu, Xiaozhuang , Bai, Kun , Zhang, Yamin , Pan, Shijie et al. Research on temperatures located within facet coating layers along z-axis of semiconductor lasers . | OPTICS AND LASER TECHNOLOGY , 2022 , 153 .
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Effect of interface morphology on thermal contact resistance in thermal management of electronic devices SCIE
期刊论文 | 2022 , 36 (17) | INTERNATIONAL JOURNAL OF MODERN PHYSICS B
WoS CC Cited Count: 1
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Abstract :

The interfacial thermal resistance between two solid materials is usually obvious in thermal management technology, but there is still no way to eliminate it nor uniform measurement standard. When taking thermal measurements because the surface roughness of instrument probe and device package directly affects the interface morphology, the change of total thermal resistance caused by the thermal contact resistance (TCR) fluctuations disturbs the accuracy of internal thermal analysis of device. We prepared samples with different surface roughness and performed thermal measurements on them, compared with test under vacuum environment and the condition filled with thermal interface materials, respectively. We found the heat-transfer mechanism of interface. More importantly, it is shown that in the interval of surface roughness Ra < 6.4, the TCR shows good consistency when filled with thermal interface materials. This result will help to improve the convenience of measurement for the accuracy of thermal measurement technology.

Keyword :

surface roughness surface roughness Thermal contact resistance Thermal contact resistance solid-solid interface solid-solid interface microelectronic device microelectronic device thermal management thermal management

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GB/T 7714 Chen, Yu-Zheng , Feng, Shi-Wei , Zhang, Ya-Min et al. Effect of interface morphology on thermal contact resistance in thermal management of electronic devices [J]. | INTERNATIONAL JOURNAL OF MODERN PHYSICS B , 2022 , 36 (17) .
MLA Chen, Yu-Zheng et al. "Effect of interface morphology on thermal contact resistance in thermal management of electronic devices" . | INTERNATIONAL JOURNAL OF MODERN PHYSICS B 36 . 17 (2022) .
APA Chen, Yu-Zheng , Feng, Shi-Wei , Zhang, Ya-Min , He, Xin , Bai, Kun , Li, Xuan . Effect of interface morphology on thermal contact resistance in thermal management of electronic devices . | INTERNATIONAL JOURNAL OF MODERN PHYSICS B , 2022 , 36 (17) .
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Identification of Traps in p-GaN Gate HEMTs During OFF-State Stress by Current Transient Method SCIE
期刊论文 | 2022 , 69 (9) , 4877-4882 | IEEE TRANSACTIONS ON ELECTRON DEVICES
WoS CC Cited Count: 7
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Abstract :

In this work, the current transient method was conducted for trap analysis in the p-GaN gate high-electron-mobility transistors (HEMTs) in the OFF-state. Based on the traditional detrapping transient measurements, the pure recovery transients can be isolated by subtracting the undetected part caused by the measurement conditions. A comparison of the measured and actual recovery transients under different drain filling voltages was presented. It suggested that this method can be effective to analyze the unregular transient curves and distinguish the charge trapping type preliminarily. In addition, three traps were identified based on the time constant spectra and the hidden absolute amplitudes of traps can be corrected using the differential amplitude spectra. The information of trap levels in the buffer layer and AlGaN barrier layer was revealed, consisting of three electron traps with energy levels of 0.313, 0.265, and 0.467 eV. The identification of the traps may provide a physical foundation for better understanding of the drain-induced trapping effect during the OFF-state in p-GaN HEMTs.

Keyword :

trapping effect trapping effect Electron traps Electron traps reliability reliability Current transient method Current transient method normally-OFF normally-OFF Behavioral sciences Behavioral sciences HEMTs HEMTs Logic gates Logic gates p-GaN gate high-electron-mobility transistors (HEMTs) p-GaN gate high-electron-mobility transistors (HEMTs) Market research Market research MODFETs MODFETs Transient analysis Transient analysis

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GB/T 7714 Pan, Shijie , Feng, Shiwei , Li, Xuan et al. Identification of Traps in p-GaN Gate HEMTs During OFF-State Stress by Current Transient Method [J]. | IEEE TRANSACTIONS ON ELECTRON DEVICES , 2022 , 69 (9) : 4877-4882 .
MLA Pan, Shijie et al. "Identification of Traps in p-GaN Gate HEMTs During OFF-State Stress by Current Transient Method" . | IEEE TRANSACTIONS ON ELECTRON DEVICES 69 . 9 (2022) : 4877-4882 .
APA Pan, Shijie , Feng, Shiwei , Li, Xuan , Bai, Kun , Lu, Xiaozhuang , Zhu, Jiayu et al. Identification of Traps in p-GaN Gate HEMTs During OFF-State Stress by Current Transient Method . | IEEE TRANSACTIONS ON ELECTRON DEVICES , 2022 , 69 (9) , 4877-4882 .
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一种用于pnp双极晶体管热阻测量的基极电流电路 incoPat zhihuiya
专利 | 2022-06-15 | CN202210673247.4
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一种用于pnp双极晶体管热阻测量的基极电流电路属于半导体器件热设计和测试领域。本发明电路包括运放芯片、N沟道MOS管、二极管D1和二极管D2。该电路可以通过简单的电路连接,集成于即成的具备负测试电流和正加热电源的热阻测试系统中,使该系统扩展出pnp双极晶体管的热阻测量功能。

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GB/T 7714 冯士维 , 白昆 , 冯志红 et al. 一种用于pnp双极晶体管热阻测量的基极电流电路 : CN202210673247.4[P]. | 2022-06-15 .
MLA 冯士维 et al. "一种用于pnp双极晶体管热阻测量的基极电流电路" : CN202210673247.4. | 2022-06-15 .
APA 冯士维 , 白昆 , 冯志红 , 李轩 , 潘世杰 . 一种用于pnp双极晶体管热阻测量的基极电流电路 : CN202210673247.4. | 2022-06-15 .
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Characterization of traps in GaN-based HEMTs by drain voltage transient and capacitance deep-level transient spectroscopy SCIE
期刊论文 | 2022 , 37 (9) | SEMICONDUCTOR SCIENCE AND TECHNOLOGY
WoS CC Cited Count: 3
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Abstract :

This paper presents a detailed investigation of trapping effect in AlGaN/GaN high-electron-mobility transistors based on the pulsed current-voltage characterization, drain voltage transient (DVT) measurement, and capacitance deep-level transient spectroscopy (C-DLTS). By monitoring the DVTs at various filling voltages and temperatures, the properties of three electron traps were obtained with the DVT measurements. Specifically, the energy levels of the former two traps were determined to be 0.28 and 0.48 eV, which was confirmed by the C-DLTS measurement performed on the same device. In addition, a third temperature-independent trap located in the GaN buffer was observed only with the DVT measurement, indicating the advantage of transient curves measurement in characterizing the traps insensitive to temperature. The combined measurements demonstrate the correlation of different techniques, which allows identifying the same trap levels to investigate the physical origin of traps.

Keyword :

gallium nitride (GaN) gallium nitride (GaN) drain voltage transients (DVTs) drain voltage transients (DVTs) high-electron-mobility transistors (HEMTs) high-electron-mobility transistors (HEMTs) trap trap capacitance deep-level transient spectroscopy (C-DLTS) capacitance deep-level transient spectroscopy (C-DLTS)

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GB/T 7714 Pan, Shijie , Feng, Shiwei , Li, Xuan et al. Characterization of traps in GaN-based HEMTs by drain voltage transient and capacitance deep-level transient spectroscopy [J]. | SEMICONDUCTOR SCIENCE AND TECHNOLOGY , 2022 , 37 (9) .
MLA Pan, Shijie et al. "Characterization of traps in GaN-based HEMTs by drain voltage transient and capacitance deep-level transient spectroscopy" . | SEMICONDUCTOR SCIENCE AND TECHNOLOGY 37 . 9 (2022) .
APA Pan, Shijie , Feng, Shiwei , Li, Xuan , Bai, Kun , Lu, Xiaozhuang , Zhang, Yamin et al. Characterization of traps in GaN-based HEMTs by drain voltage transient and capacitance deep-level transient spectroscopy . | SEMICONDUCTOR SCIENCE AND TECHNOLOGY , 2022 , 37 (9) .
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