ZnO　thin　films　were　grown　by　pulsed　laser　deposition　on　titanium　substrates　at　different　substrate　temperatures　ranging　from　300　to　700　degrees　C.　X-ray　diffraction　(XRD),　X-ray　photoelectron　spectroscopy　(XPS),　photoluminescence,　and　Raman　spectroscopy　are　employed　to　investigate　the　change　of　properties.　XRD,　XPS,　and　Raman　data　showed　that　the　films　consisted　of　TiO2　at　high　substrate　temperature,　which　will　deteriorate　the　crystallization　quality　of　ZnO　films.　The　optimum　temperature　for　the　growth　of　ZnO　films　on　the　Ti　substrate　is　about　500　degrees　C　in　this　paper.　The　ZnO　films　grown　on　titanium　substrate　can　be　used　in　direct　current,　microwave,　and　medical　applications.　Copyright　(C)　2014　John　Wiley　&　Sons,　Ltd.