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Author:

Qiao, Y. B. (Qiao, Y. B..) | Feng, S. W. (Feng, S. W..) (Scholars:冯士维) | Xiong, C. (Xiong, C..) | Wang, X. W. (Wang, X. W..) | Ma, X. Y. (Ma, X. Y..) | Zhu, H. (Zhu, H..) | Wei, G. H. (Wei, G. H..)

Indexed by:

EI Scopus SCIE

Abstract:

The degradation of AlGaAs/GaAs laser diodes is studied in detail using laser scanning confocal microscopy, cathodoluminescence images, and x-ray diffraction (XRD) techniques. Our analysis has identified a degradation mechanism that results from the periodic distribution of the carrier density and the near-field intensity originating from periodic spatial hole burning. Based on the XRD measurements, we find that the epitaxial layer enters a polycrystalline phase during degradation due to the dark line defects, and the out-of-plane strain and in-plane compressive stress are induced by degradation. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3634051]

Keyword:

gallium arsenide III-V semiconductors quantum well lasers X-ray diffraction optical microscopy semiconductor epitaxial layers carrier density aluminium compounds optical hole burning cathodoluminescence

Author Community:

  • [ 1 ] [Qiao, Y. B.]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing, Peoples R China
  • [ 2 ] [Feng, S. W.]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing, Peoples R China
  • [ 3 ] [Xiong, C.]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing, Peoples R China
  • [ 4 ] [Zhu, H.]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing, Peoples R China
  • [ 5 ] [Wei, G. H.]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing, Peoples R China
  • [ 6 ] [Wang, X. W.]Chinese Acad Sci, Inst Semicond, Natl Engn Res Ctr Optoelect Devices, Beijing 100083, Peoples R China
  • [ 7 ] [Ma, X. Y.]Chinese Acad Sci, Inst Semicond, Natl Engn Res Ctr Optoelect Devices, Beijing 100083, Peoples R China

Reprint Author's Address:

  • 冯士维

    [Feng, S. W.]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing, Peoples R China

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Source :

APPLIED PHYSICS LETTERS

ISSN: 0003-6951

Year: 2011

Issue: 10

Volume: 99

4 . 0 0 0

JCR@2022

ESI Discipline: PHYSICS;

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 17

SCOPUS Cited Count: 18

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

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