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Author:

Zhang, Peng (Zhang, Peng.) | Song, Yanrong (Song, Yanrong.) (Scholars:宋晏蓉) | Tian, Jinrong (Tian, Jinrong.) | Zhang, Xinping (Zhang, Xinping.) (Scholars:张新平) | Zhang, Zhigang (Zhang, Zhigang.)

Indexed by:

EI Scopus SCIE

Abstract:

InGaAs strained quantum wells (QWs) with GaAs, AlGaAs, and GaAsP barriers are widely used in optically pumped vertical-external-cavity surface-emitting lasers operating at 1 mu m wavelength band. Compared with the reported data, the model-solid theory, which is more suitable for the studied materials, is selected to calculate the band offset. The band structures and the gain characteristics of the three different QWs are computed and compared, and the theoretical results are in good agreement with the recent experimental reports. The numerical simulation shows that the QW with the GaAs barrier has the highest absorption but the lowest peak gain, while for the AlGaAs barrier, it has the lowest absorption but the highest peak gain, and for the GaAsP barrier, it has a moderate absorption and peak gain. GaAsP is the most appropriate candidate for the barrier of InGaAs strained QW when the low-threshold, large-gain, and high-temperature characteristics are demanded simultaneously.

Keyword:

band structure optical pumping gallium arsenide III-V semiconductors quantum well lasers aluminium compounds indium compounds gallium compounds surface emitting lasers

Author Community:

  • [ 1 ] [Zhang, Peng]Beijing Univ Technol, College Appl Sci, Beijing 100124, Peoples R China
  • [ 2 ] [Song, Yanrong]Beijing Univ Technol, College Appl Sci, Beijing 100124, Peoples R China
  • [ 3 ] [Tian, Jinrong]Beijing Univ Technol, College Appl Sci, Beijing 100124, Peoples R China
  • [ 4 ] [Zhang, Xinping]Beijing Univ Technol, College Appl Sci, Beijing 100124, Peoples R China
  • [ 5 ] [Zhang, Xinping]Peking Univ, Sch Elect Engn & Comp Sci, Beijing 100871, Peoples R China

Reprint Author's Address:

  • [Zhang, Peng]Beijing Univ Technol, College Appl Sci, Beijing 100124, Peoples R China

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Source :

JOURNAL OF APPLIED PHYSICS

ISSN: 0021-8979

Year: 2009

Issue: 5

Volume: 105

3 . 2 0 0

JCR@2022

ESI Discipline: PHYSICS;

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 34

SCOPUS Cited Count: 47

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

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