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Abstract:
介绍了化学气相沉积法制备难熔金属钼膜层的原理和方法.以MoF6和H2为原料,采用化学气相沉积法在纯铜基体上沉积出难熔金属钼膜层.分析研究了沉积层的组织、结构和硬度.实验结果表明:沉积膜层显微组织随沉积温度变化而不同,沉积温度较低时沉积层显微组织为细晶层状结构,沉积层硬度可达677HV;沉积温度较高时沉积层显微组织为致密的柱状晶,硬度稍高于一般烧结钼.
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材料热处理学报
ISSN: 1009-6264
Year: 2005
Issue: 3
Volume: 26
Page: 51-53
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count: 15
Chinese Cited Count:
30 Days PV: 4
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