• Complex
  • Title
  • Keyword
  • Abstract
  • Scholars
  • Journal
  • ISSN
  • Conference
搜索

Author:

黄传实 (黄传实.) | 秦飞 (秦飞.) (Scholars:秦飞)

Abstract:

在进行TSV电镀铜柱压出实验时,假设界面上的切应力为均匀分布的,通过有限元模拟发现,在铜柱直径为50μm的情况下,TSV硅板的厚度对界面上切应力的分布有很大影响,本文通过有限元模拟,对比铜柱压出时不同厚度TSV界面处的切应力分布,得到最适合实验的TSV硅板的厚度。

Keyword:

TSV厚度 电镀铜柱 界面 切应力 压出

Author Community:

  • [ 1 ] 北京工业大学机械工程与应用电子技术学院

Reprint Author's Address:

Email:

Show more details

Related Keywords:

Source :

Year: 2013

Language: Chinese

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 13

Online/Total:921/10614220
Address:BJUT Library(100 Pingleyuan,Chaoyang District,Beijing 100124, China Post Code:100124) Contact Us:010-67392185
Copyright:BJUT Library Technical Support:Beijing Aegean Software Co., Ltd.