Abstract:
<正>一、引言同步幅射光具有高亮度,平行性好,发射度小,光谱连续可调等显著特点, 是目前x射线亚微米光刻最理想的光源。北京正负电子对撞机3B1束线正是为探索X射线亚微米光刻的实验条件和工艺手段而建造的一条专用束线。
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Year: 1990
Language: Chinese
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 11
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