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Author:

Zhu, Xiaoliang (Zhu, Xiaoliang.) | Li, Desheng (Li, Desheng.) (Scholars:李德胜) | Liu, Bendong (Liu, Bendong.) | Zhe, Jiang (Zhe, Jiang.)

Indexed by:

CPCI-S EI Scopus

Abstract:

This paper presents a new way to design a low-cost micro-thermoelectric generator (mu-TEG) which can be fabricated by using electrochemical and MEMS technology. The overall dimension of the mu-TEG is about 13mm x 13mm x 0.4mm, which contains 128 p- and n-type pairs of semiconductors connected electrically in series and thermally in parallel. The p-type antimony telluride (Sb2Te3) and n-type bismuth telluride (Bi2Te3) with an optimal thickness of 20 mu m were designed to deposit in a flexible polymer mold formed by photolithographic patterning of Polyimide (PI) with a three electrode configuration. Simulations of the thermocouple with PI mold were carried on, using finite element analysis. The analysis shows the possibility to achieve 3.5 mV while the difference in temperature is 10K and the thickness of the silicon substrate is 400 mu m, which reveals that the output power of the thermocouple without releasing process is only 4% lower than the one with the releasing process. Therefore the PI mold is not removed, considering the potential for easier fabrication and lower cost. The deposition parameters were also studied and optimized for the best thermoelectric performance. In our experiments, the n- and p-type semiconductors could be obtained when the voltage and current are around 50mV versus saturated calomel electrode (SCE) and 40 mA, respectively.

Keyword:

ANSYS Seebeck effect Cross-plane Micro-thermoelectric generator MEMS

Author Community:

  • [ 1 ] [Zhu, Xiaoliang]Beijing Univ Technol, Inst MEMS Technol, Beijing, Peoples R China
  • [ 2 ] [Li, Desheng]Beijing Univ Technol, Inst MEMS Technol, Beijing, Peoples R China
  • [ 3 ] [Liu, Bendong]Beijing Univ Technol, Inst MEMS Technol, Beijing, Peoples R China
  • [ 4 ] [Zhe, Jiang]Univ Akron, Dept Mech Engn, Akron, OH 44325 USA

Reprint Author's Address:

  • [Zhu, Xiaoliang]Beijing Univ Technol, Inst MEMS Technol, Beijing, Peoples R China

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Source :

MICRO-NANO TECHNOLOGY XIII

ISSN: 1013-9826

Year: 2012

Volume: 503

Page: 240-,

Language: English

Cited Count:

WoS CC Cited Count: 3

SCOPUS Cited Count: 4

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 13

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