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Author:

An, Tong (An, Tong.) | Li, Zezheng (Li, Zezheng.) | Zhang, Yakun (Zhang, Yakun.) | Qin, Fei (Qin, Fei.) (Scholars:秦飞) | Wang, Liang (Wang, Liang.) | Lin, Zhongkang (Lin, Zhongkang.) | Tang, Xinling (Tang, Xinling.) | Dai, Yanwei (Dai, Yanwei.) | Gong, Yanpeng (Gong, Yanpeng.) | Chen, Pei (Chen, Pei.)

Indexed by:

EI Scopus SCIE

Abstract:

In this article, the correlation between the thermal contact resistance and the surface roughness characteristics of the contact interface in the press-pack insulated-gate bipolar transistor (PP-IGBT) modules during power cycling was studied by experimental measurements and finite-element (FE) simulation-based factorial design analysis. Thermal transient test technology was applied to examine the change in the thermal characteristic parameters of the PP-IGBT module. This shows that the increase in the thermal contact resistance of the Al metallization/emitter Mo contact interface occurs more dramatically during power cycling. A 3-D surface profilometer was used to evaluate the surface morphology parameters of the Al metallization/emitter Mo contact interface. The equivalent root-mean-square (RMS) roughness increases during power cycling, and the equivalent asperity slope and the equivalent spacing between asperities increase slightly. Additionally, the surface roughening in the corner area of the chip is more obvious than in other regions. A fractional factorial design analysis based on FE simulations was performed. The results indicate that the thermal contact resistance strongly depends on the main effects of the real contact area and the spacing between the asperities, and the RMS roughness and the asperity slope interaction.

Keyword:

Surface resistance Surface roughness press-pack insulated-gate bipolar transistor (PP-IGBT) Rough surfaces Power cycling Contact resistance Surface morphology Temperature measurement thermal contact resistance surface roughness Thermal resistance

Author Community:

  • [ 1 ] [An, Tong]Beijing Univ Technol, Fac Mat & Mfg, Inst Elect Packaging Technol & Reliabil, Beijing 100124, Peoples R China
  • [ 2 ] [Li, Zezheng]Beijing Univ Technol, Fac Mat & Mfg, Inst Elect Packaging Technol & Reliabil, Beijing 100124, Peoples R China
  • [ 3 ] [Zhang, Yakun]Beijing Univ Technol, Fac Mat & Mfg, Inst Elect Packaging Technol & Reliabil, Beijing 100124, Peoples R China
  • [ 4 ] [Qin, Fei]Beijing Univ Technol, Fac Mat & Mfg, Inst Elect Packaging Technol & Reliabil, Beijing 100124, Peoples R China
  • [ 5 ] [Dai, Yanwei]Beijing Univ Technol, Fac Mat & Mfg, Inst Elect Packaging Technol & Reliabil, Beijing 100124, Peoples R China
  • [ 6 ] [Gong, Yanpeng]Beijing Univ Technol, Fac Mat & Mfg, Inst Elect Packaging Technol & Reliabil, Beijing 100124, Peoples R China
  • [ 7 ] [Chen, Pei]Beijing Univ Technol, Fac Mat & Mfg, Inst Elect Packaging Technol & Reliabil, Beijing 100124, Peoples R China
  • [ 8 ] [An, Tong]Beijing Univ Technol, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China
  • [ 9 ] [Li, Zezheng]Beijing Univ Technol, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China
  • [ 10 ] [Zhang, Yakun]Beijing Univ Technol, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China
  • [ 11 ] [Qin, Fei]Beijing Univ Technol, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China
  • [ 12 ] [Dai, Yanwei]Beijing Univ Technol, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China
  • [ 13 ] [Gong, Yanpeng]Beijing Univ Technol, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China
  • [ 14 ] [Chen, Pei]Beijing Univ Technol, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China
  • [ 15 ] [Wang, Liang]Global Energy Interconnect Res Inst Co Ltd, Beijing 100031, Peoples R China
  • [ 16 ] [Lin, Zhongkang]Global Energy Interconnect Res Inst Co Ltd, Beijing 100031, Peoples R China
  • [ 17 ] [Tang, Xinling]Global Energy Interconnect Res Inst Co Ltd, Beijing 100031, Peoples R China

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Source :

IEEE TRANSACTIONS ON POWER ELECTRONICS

ISSN: 0885-8993

Year: 2022

Issue: 6

Volume: 37

Page: 7286-7298

6 . 7

JCR@2022

6 . 7 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:49

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 18

SCOPUS Cited Count: 18

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 12

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