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Author:

王霄翔 (王霄翔.) | 龙连春 (龙连春.)

Abstract:

化学气相沉积(CVD)是近几十年发展起来制备无机材料的技术,CVD反应室内部的流场分布是影响产物的质量及产量的关键因素,本文建立了化学气相沉积炉的三维简化模型,并对其进行了不考虑温度条件下的纯气体湍流模拟研究。根据对模拟结果的分析可知,随高度增加,沉积炉内流场分布越来越混乱,且气体流速呈上升趋势。

Keyword:

数值模拟 湍流 流场 化学气相沉积

Author Community:

  • [ 1 ] 北京工业大学材料与制造学部

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Year: 2022

Language: Chinese

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 12

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