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Author:

Jiang, Qian (Jiang, Qian.) | Zhang, Jing (Zhang, Jing.) | Xie, Liang (Xie, Liang.) | Meng, Junhua (Meng, Junhua.) | Zhang, Xingwang (Zhang, Xingwang.)

Indexed by:

EI Scopus

Abstract:

Monoclinic gallium oxide (bGa2O3 ) is an emerging wide bandgap semiconductor with an ultrawide bandgap (~ 4. 9 eV) at room temperature, an high breakdown field strength (~8 MV/ cm), a Baligas figure of merit (BFOM) of 3 400, and availability of native single crystal substrates using inexpensive meltbased growth methods. These attractive properties of bGa2 O3 make it an ideal candidate for potential applications such as highpower electronic devices and solar blind ultraviolet (UV) photodetectors. It is well known that the high quality epitaxial layer is the prerequisite for the fabrication of high performance devices. Up to now, the bGa2 O3 epitaxial layers have been prepared by various methods, and several kinds of devices have been fabricated. However, many challenges still exist, including heteroepitaxial growth maturity, ptype doping, and device performance optimization. This article reviews the current status of the synthesis technologies, the substrates for homoepitaxy / heteroepitaxy, doping, electrical properties and the applications of power devices and ultraviolet photodetectors. © 2022 Cailiao Daobaoshe/ Materials Review. All rights reserved.

Keyword:

Power semiconductor devices Gallium compounds Substrates Wide band gap semiconductors Photons Single crystals Epitaxial growth Semiconductor doping Photodetectors Energy gap

Author Community:

  • [ 1 ] [Jiang, Qian]School of Information Science and Technology, North China University of Technology, Beijing; 100144, China
  • [ 2 ] [Jiang, Qian]Key Lab oratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing; 100083, China
  • [ 3 ] [Zhang, Jing]School of Information Science and Technology, North China University of Technology, Beijing; 100144, China
  • [ 4 ] [Xie, Liang]School of Information Science and Technology, North China University of Technology, Beijing; 100144, China
  • [ 5 ] [Meng, Junhua]Faculty of Science, Beijing University of Technology, Beijing; 100124, China
  • [ 6 ] [Zhang, Xingwang]Key Lab oratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing; 100083, China
  • [ 7 ] [Zhang, Xingwang]Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing; 100049, China

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Source :

Materials Reports

ISSN: 1005-023X

Year: 2022

Issue: 13

Volume: 36

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 7

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