• Complex
  • Title
  • Keyword
  • Abstract
  • Scholars
  • Journal
  • ISSN
  • Conference
搜索

Author:

Liu, S. (Liu, S..) | Ma, L. (Ma, L..) | Zhen, C. (Zhen, C..) | Li, D. (Li, D..) | Wang, Y. (Wang, Y..) | Jia, Q. (Jia, Q..) | Guo, F. (Guo, F..)

Indexed by:

EI Scopus SCIE

Abstract:

Bismuth telluride-based thermoelectric (TE) devices were widely used in waste heat recovery due to their high thermoelectric figure of merit (ZT), but the severe diffusion between Sn-based solder and TE pillar generated porous and brittle Sn-Te intermetallic compound (IMC), which seriously restricted the reliable service of devices. Ni-based coating was used but the thick Ni-Te IMC also impaired the properties of TE pillars. In this work, the crystalline Co-P coating was inserted between the p-type TE material Bi0.5Sb1.5Te3 and the solder by electrodeposition, and the power generation sustainability of the TE pillar were significantly improved, and the mechanism was revealed. The microstructural characterization proved that the Co-P coating could effectively resist the diffusion of active Sn, Bi, Sb, Cu atoms. Co-P coating would provide support for the structural integrity and performance sustainability of TE pillars. It was worth noting that an ultrathin CoTe2 IMC layer was formed between the Co-P coating and the Bi-Sb-Te pillar, which was much thinner than the Ni-Te IMC layer reported in the literature. This indicated that Co-P only consumed little thermoelectric elements, but also a good metallurgical bond was formed between the Co-P and the Bi-Sb-Te. After aging at 423 K for 150 h, the maximum output power and average Seebeck coefficient of the TE pillar without coating dropped significantly by 74% and 34%, respectively, and the internal resistance rose by 67%. Remarkably, the maximum output power and average Seebeck coefficient of the TE pillar protected by the Co-P coating only decreased by 14% and 5%, respectively, and the internal resistance only increased by 6%. © 2023 Elsevier Ltd

Keyword:

Intermetallic compound Interfacial diffusion Solder Co-P coating Bismuth telluride Thermoelectric device

Author Community:

  • [ 1 ] [Liu S.]Faculty of Materials and Manufacturing, Beijing University of Technology, Beijing, 100124, China
  • [ 2 ] [Liu S.]Key Laboratory of Advanced Functional Materials, Education Ministry of China, Beijing University of Technology, Beijing, 100124, China
  • [ 3 ] [Ma L.]Faculty of Materials and Manufacturing, Beijing University of Technology, Beijing, 100124, China
  • [ 4 ] [Ma L.]Key Laboratory of Advanced Functional Materials, Education Ministry of China, Beijing University of Technology, Beijing, 100124, China
  • [ 5 ] [Zhen C.]Faculty of Materials and Manufacturing, Beijing University of Technology, Beijing, 100124, China
  • [ 6 ] [Zhen C.]Key Laboratory of Advanced Functional Materials, Education Ministry of China, Beijing University of Technology, Beijing, 100124, China
  • [ 7 ] [Li D.]Faculty of Materials and Manufacturing, Beijing University of Technology, Beijing, 100124, China
  • [ 8 ] [Li D.]Key Laboratory of Advanced Functional Materials, Education Ministry of China, Beijing University of Technology, Beijing, 100124, China
  • [ 9 ] [Wang Y.]Faculty of Materials and Manufacturing, Beijing University of Technology, Beijing, 100124, China
  • [ 10 ] [Wang Y.]Key Laboratory of Advanced Functional Materials, Education Ministry of China, Beijing University of Technology, Beijing, 100124, China
  • [ 11 ] [Jia Q.]Faculty of Materials and Manufacturing, Beijing University of Technology, Beijing, 100124, China
  • [ 12 ] [Jia Q.]Key Laboratory of Advanced Functional Materials, Education Ministry of China, Beijing University of Technology, Beijing, 100124, China
  • [ 13 ] [Guo F.]Faculty of Materials and Manufacturing, Beijing University of Technology, Beijing, 100124, China
  • [ 14 ] [Guo F.]Key Laboratory of Advanced Functional Materials, Education Ministry of China, Beijing University of Technology, Beijing, 100124, China

Reprint Author's Address:

Email:

Show more details

Related Keywords:

Source :

Applied Energy

ISSN: 0306-2619

Year: 2023

Volume: 352

1 1 . 2 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:19

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

Affiliated Colleges:

Online/Total:998/10685589
Address:BJUT Library(100 Pingleyuan,Chaoyang District,Beijing 100124, China Post Code:100124) Contact Us:010-67392185
Copyright:BJUT Library Technical Support:Beijing Aegean Software Co., Ltd.