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Author:

Wen, Qian (Wen, Qian.) | Guo, Chunsheng (Guo, Chunsheng.) | Zhang, Meng (Zhang, Meng.) | Zheng, Xiang (Zheng, Xiang.) | Feng, Shiwei (Feng, Shiwei.) | Zhang, Yamin (Zhang, Yamin.)

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Abstract:

The large numbers of high-energy carriers that occur in semiconductor devices under semi-on state conditions can cause significant device degradation. The effects of different stresses on the electrical and trapping characteristics of GaN-based high-electron-mobility transistors (HEMTs) are investigated. Test results for GaN HEMTs under semi-on state conditions show that the electrical characteristics of these devices degrade to a certain extent after they are subjected to electrical pulse stress cycles with different drain voltage, frequencies, and duty cycles; a degree of degradation also occurs in the electrical characteristics of the devices when they are subjected to direct current electrical stresses. After electrical stress is applied, the absolute amplitude of the traps in the device increases, thus indicating an increase in the trap density. The results show that voltage is the main driver for device damage, with the current playing an accelerating role through its effects on device temperature or by supplying hot electrons; therefore, the drain voltage has the most significant effect on device degradation, which is mainly due to channel high-energy hot electron injection. © 2024 Elsevier Ltd

Keyword:

Wide band gap semiconductors Gallium nitride Hot electrons High electron mobility transistors Electrons III-V semiconductors Drain current Electron mobility

Author Community:

  • [ 1 ] [Wen, Qian]Institute of Semiconductor Device Reliability Physics, Beijing University of Technology, Beijing; 100124, China
  • [ 2 ] [Guo, Chunsheng]Institute of Semiconductor Device Reliability Physics, Beijing University of Technology, Beijing; 100124, China
  • [ 3 ] [Zhang, Meng]Institute of Semiconductor Device Reliability Physics, Beijing University of Technology, Beijing; 100124, China
  • [ 4 ] [Zheng, Xiang]Center for Device Thermography and Reliability, University of Bristol, Bristol; BS8 1TL, United Kingdom
  • [ 5 ] [Feng, Shiwei]Institute of Semiconductor Device Reliability Physics, Beijing University of Technology, Beijing; 100124, China
  • [ 6 ] [Zhang, Yamin]Institute of Semiconductor Device Reliability Physics, Beijing University of Technology, Beijing; 100124, China

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Source :

Solid-State Electronics

ISSN: 0038-1101

Year: 2024

Volume: 220

1 . 7 0 0

JCR@2022

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ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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