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Author:

Zheng, Xiang (Zheng, Xiang.) | Feng, Shiwei (Feng, Shiwei.) (Scholars:冯士维) | Zhang, Yamin (Zhang, Yamin.) | He, Xin (He, Xin.) | Wang, Yu (Wang, Yu.)

Indexed by:

EI Scopus SCIE

Abstract:

The reliability of GaN high-electron-mobility transistors remains limited by trapping, and a new way to characterize traps is through the drain current transient. In this paper, we report a differential amplitude spectrum (DAS) from which we could extract the exact amount that a trap contributes to charging/discharging from the current transient. We compared the time constant spectrum and the DAS in extracting traps' amplitudes theoretically and experimentally. Using the DAS, we investigated the trapping effect and systematically identified the positions and mechanisms of traps with Ea values of 0.10, 0.38, 0.45, and 0.61 eV in our samples. In particular, we demonstrated that the semi-oN state with high-drain voltage in the filling process can maximize the charge trapping in both the AIGaN layer and GaN buffer. In addition, we experimentally proved that measured voltage in the linear region was the best choice for these samples.

Keyword:

different amplitude spectrum (DAS) high-electron-mobility transistor (HEMT) Current transient GaN trapping effect

Author Community:

  • [ 1 ] [Zheng, Xiang]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 2 ] [Feng, Shiwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 3 ] [Zhang, Yamin]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 4 ] [He, Xin]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 5 ] [Wang, Yu]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China

Reprint Author's Address:

  • 冯士维

    [Feng, Shiwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China

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Source :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

Year: 2017

Issue: 4

Volume: 64

Page: 1498-1504

3 . 1 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:165

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 35

SCOPUS Cited Count: 38

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 7

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