Close-packed　monolayer　silica　spheres　organized　through　a　self-assembly　process　have　been　widely　used　in　micro/nano　fabrications.　In　this　study,　we　present　the　effects　of　substrate　on　the　near-field　enhancement　of　microsphere-assisted　laser　processing.　There　are　significant　differences　in　the　surface　morphology　of　sub-micro　hole　arrays　on　substrates　with　different　refractive　indices,　which　were　fabricated　at　the　same　laser　fluence　by　a　KrF　excimer　laser　(lambda=248　nm).　It　is　found　that　the　position　of　the　maximum　enhancement　removes　from　the　exit　surface　of　the　silica　sphere　into　the　sphere　as　the　refractive　index　of　substrate　increased　based　on　the　simulation.　In　addition,　the　field　distribution　curve　oscillates　when　there　is　a　substrate　under　the　microsphere,　and　oscillation　spreads　deeper　into　the　substrate　with　a　high　refractive　index.　The　results　contribute　toward　the　optimization　of　the　process　conditions　of　the　microsphere-assisted　laser　micro/nano　patterning　technique　and　make　the　modification　profile　of　the　material　more　controllable.　(C)　2015　Elsevier　B.V.　All　rights　reserved.