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Author:

Wu, Yan (Wu, Yan.) | Ji, Lingfei (Ji, Lingfei.) (Scholars:季凌飞) | Lin, Zhenyuan (Lin, Zhenyuan.) | Hong, Minghui (Hong, Minghui.) | Wang, Sicong (Wang, Sicong.) | Zhang, Yongzhe (Zhang, Yongzhe.) (Scholars:张永哲)

Indexed by:

EI Scopus SCIE

Abstract:

In this work, KrF excimer laser irradiation of n-type SiC is used to form Ohmic contacts at the interfaces between the irradiated SiC and various types of metals with different work functions without subsequent thermal annealing. Ohmic contacts are formed between laser-treated 6H-SiC and Ti at a laser fluence of 0.7 J/cm(2). Moreover, in the fluence range of 0.7-1.3 J/cm(2), Ohmic characteristics are also observed between irradiated 6HSiC and Au, which is a representative inert metal. The laser-induced heavy doping effect reduces the thickness of the Schottky barrier between the metal and SiC, and the formation of graphene sheets on the irradiated SiC surface reduces the barrier height, resulting in the direct formation of Ohmic contacts. Our findings thus demonstrate the potential of this laser treatment method to achieve Ohmic contacts between n-type SiC and a broad range of metal electrodes without requiring high-temperature annealing.

Keyword:

Excimer laser Barrier height Ohmic contact SiC

Author Community:

  • [ 1 ] [Wu, Yan]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Ji, Lingfei]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Lin, Zhenyuan]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Wang, Sicong]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Hong, Minghui]Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 117576, Singapore
  • [ 6 ] [Zhang, Yongzhe]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

Reprint Author's Address:

  • 季凌飞

    [Ji, Lingfei]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China

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Source :

CURRENT APPLIED PHYSICS

ISSN: 1567-1739

Year: 2019

Issue: 4

Volume: 19

Page: 521-527

2 . 4 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:123

JCR Journal Grade:2

Cited Count:

WoS CC Cited Count: 12

SCOPUS Cited Count: 16

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 12

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