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Author:

Deng, Haoliang (Deng, Haoliang.) | Zhang, Ming (Zhang, Ming.) | Li, Tong (Li, Tong.) | Wei, Jizhou (Wei, Jizhou.) | Chu, Shangjie (Chu, Shangjie.) | Du, Minyong (Du, Minyong.) | Yan, Hui (Yan, Hui.)

Indexed by:

EI Scopus SCIE

Abstract:

Amorphous BiFeO3 thin films were grown on an indium tin oxide glass substrate using RF magnetron sputtering at room temperature. The resistive switching behavior of amorphous BiFeO3 thin films was investigated. The Au/amorphous BiFeO3/indium tin oxide device exhibited the stable unipolar resistive switching behavior with a substantial resistance ratio (larger than 10(2)) between low and high resistance states and the excellent retention performance. The low resistance state exhibited a linear Ohmic behavior, while the high resistance state conduction could be ascribed to the trap controlled space-charge limited conduction mechanism. Based on the X-ray photoelectron spectroscopy, the observed resistive switching behavior was mainly attributed to the electric field induced migration of oxygen vacancies. (C) 2015 Elsevier B. V. All rights reserved.

Keyword:

Thin films Resistive switching Amorphous BiFeO3 Oxygen vacancies

Author Community:

  • [ 1 ] [Deng, Haoliang]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Zhang, Ming]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Wei, Jizhou]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Chu, Shangjie]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Du, Minyong]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Yan, Hui]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 7 ] [Deng, Haoliang]Tianjin Univ Technol & Educ, Sch Sci, Tianjin 300222, Peoples R China
  • [ 8 ] [Li, Tong]Tianjin Univ Technol & Educ, Sch Elect Engn, Tianjin 300222, Peoples R China

Reprint Author's Address:

  • [Zhang, Ming]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

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Source :

JOURNAL OF ALLOYS AND COMPOUNDS

ISSN: 0925-8388

Year: 2015

Volume: 639

Page: 235-238

6 . 2 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:319

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 16

SCOPUS Cited Count: 16

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 5

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