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Author:

Deng, Haoliang (Deng, Haoliang.) | Zhang, Ming (Zhang, Ming.) | Wei, Jizhou (Wei, Jizhou.) | Chu, Shangjie (Chu, Shangjie.) | Du, Minyong (Du, Minyong.) | Yan, Hui (Yan, Hui.)

Indexed by:

EI Scopus SCIE

Abstract:

The Bi0.8Ba0.2FeO3 (BBFO) thin film was deposited on the conducting Nb:SrTiO3 (NSTO) (100) single crystal substrate by pulsed laser deposition. Nonvolatile bipolar resistive switching effect was observed in an Au/BBFO/NSTO capacitor structure. By changing the polarity of the external pulsed voltage, the device could be switched reversibly between two stable resistance states. The resistive ratio is about 10 at a read voltage of -0.5 V after applying +/- 1.5 V pulse voltages. The mechanism of the resistive switching behavior could be attributed to the electric field induced migration of oxygen vacancies, which changes the height and width of the barrier at the BBFO/NSTO interface. (C) 2015 Elsevier Ltd. All rights reserved.

Keyword:

Thin films Resistive switching BiFeO3 Interfaces

Author Community:

  • [ 1 ] [Deng, Haoliang]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Zhang, Ming]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Wei, Jizhou]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Chu, Shangjie]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Du, Minyong]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Yan, Hui]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 7 ] [Deng, Haoliang]Tianjin Univ Technol & Educ, Coll Sci, Tianjin 300222, Peoples R China

Reprint Author's Address:

  • [Zhang, Ming]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

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Source :

SOLID-STATE ELECTRONICS

ISSN: 0038-1101

Year: 2015

Volume: 109

Page: 72-75

1 . 7 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:190

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 10

SCOPUS Cited Count: 9

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

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