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Author:

Xu, Hong (Xu, Hong.) | Jiang, Yijian (Jiang, Yijian.) (Scholars:蒋毅坚) | Luo, Sijun (Luo, Sijun.) | Ma, Yunfeng (Ma, Yunfeng.) | Wang, Yue (Wang, Yue.)

Indexed by:

EI Scopus SCIE

Abstract:

Tantalum-pentoxide (Ta2O5) single crystals doped with Ti were grown by the floating zone method. X-ray diffraction (XRD) characterization indicates that the crystal symmetry of Ti-doped Ta2O5 crystals is tetragonal. The dielectric dissipation is decreased and the dielectric constant is greatly enhanced by doping Ti. The dielectric permittivity along [100] direction of (Ta2O5)(0.95)(TiO2)(0.05) crystal measured at 1 MHz and room temperature is 711, which is eight times more than that of Ta2O5 crystal. Dielectric properties measurement demonstrates a strongly anisotropic dielectric constant along the [100] and [001] directions of Ti-doped Ta2O5 crystals. At room temperature the dielectric constant along [100] direction is about twenty times of that along [001] direction in (Ta2O5) 0.95(TiO2) 0.05 crystal while only three times in Ta2O5 crystal. The results suggest that Ti-doped Ta2O5 crystal materials show great value and potential for both of theoretical study on dielectrics and application in microelectronics devices. (C) 2013 Elsevier B. V. All rights reserved.

Keyword:

Dielectrics Crystal growth Ta2O5 Anisotropy Floating zone technique

Author Community:

  • [ 1 ] [Xu, Hong]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Jiang, Yijian]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Ma, Yunfeng]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Wang, Yue]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 5 ] [Xu, Hong]Tulane Univ, Dept Phys & Engn Phys, New Orleans, LA 70118 USA
  • [ 6 ] [Luo, Sijun]Tulane Univ, Dept Phys & Engn Phys, New Orleans, LA 70118 USA

Reprint Author's Address:

  • [Xu, Hong]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China

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Source :

JOURNAL OF ALLOYS AND COMPOUNDS

ISSN: 0925-8388

Year: 2014

Volume: 588

Page: 42-45

6 . 2 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:341

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 9

SCOPUS Cited Count: 9

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 7

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