Indexed by:
Abstract:
用射频溅射法在P型Si(100)衬底上沉积立方氮化硼(c-BN)薄膜,薄膜的成分由傅里叶变换红外谱标识,用紫外-可见分光光度计测量了c-BN薄膜的反射光谱,利用K-K(Kramers-Kroning)关系从反射谱计算出c-BN薄膜的光吸收系数,进而确定c-BN薄膜的光学带隙.对于立方相含量为55.4%的c-BN薄膜,光学带隙为5.38 eV.
Keyword:
Reprint Author's Address:
Email:
Source :
物理学报
ISSN: 1000-3290
Year: 2008
Issue: 10
Volume: 57
Page: 6631-6635
1 . 0 0 0
JCR@2022
ESI Discipline: PHYSICS;
JCR Journal Grade:2
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count: 4
Chinese Cited Count:
30 Days PV: 3
Affiliated Colleges: