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Abstract:
研究了高温工作环境下Ti/Al/Ni/Au(15 nm/220 nm/40 nm/50 nm)四层复合金属层与n-GaN(Nd=3.7×1017 cm-3,Nd=3.0×1018 cm-3)的欧姆接触特性,试验结果标明,当测量温度低于300 ℃时,存储时间为0~24 h,其接触电阻率基本不变,表现出良好的温度可靠性;分别经过300、500 ℃各24 h高温存储后,其欧姆接触发生了较为明显的退化,且不可恢复.接触电阻率均随测量温度的增加而增大,掺杂浓度越高,其接触电阻率随测量温度的升高缓慢增加;重掺杂样品的n-GaN/Ti/Al/Ni/Au欧姆接触具有更高的高温可靠性.
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Source :
北京工业大学学报
ISSN: 0254-0037
Year: 2007
Issue: 11
Volume: 33
Page: 1153-1157
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count: 1
Chinese Cited Count:
30 Days PV: 13
Affiliated Colleges: