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Author:

Zhang, Ting (Zhang, Ting.) | Cheng, Yan (Cheng, Yan.) | Song, Zhitang (Song, Zhitang.) | Liu, Bo (Liu, Bo.) (Scholars:刘博) | Feng, Songlin (Feng, Songlin.) | Han, Xiaodong (Han, Xiaodong.) (Scholars:韩晓东) | Zhang, Ze (Zhang, Ze.) | Chen, Bomy (Chen, Bomy.)

Indexed by:

EI Scopus SCIE

Abstract:

The crystallization of Ge-Sb-Te and Si-Sb-Te phase-change materials has been characterized by in situ time-dependent resistance measurement and transmission electron microscopy. Although silicon has various properties that are similar to those of germanium, Si-Sb-Te and Ge-Sb-Te crystallize via different processes. Si-Sb-Te has a complex structure (mainly hexagonal) while Ge-Sb-Te has a simple face-centered cubic structure when annealed at 433 K for several hours. (c) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

Keyword:

phase-change memory SiSbTe GeSbTe phase-change material

Author Community:

  • [ 1 ] [Zhang, Ting]Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Lab Nanotechnol, Shanghai 200050, Peoples R China
  • [ 2 ] [Song, Zhitang]Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Lab Nanotechnol, Shanghai 200050, Peoples R China
  • [ 3 ] [Liu, Bo]Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Lab Nanotechnol, Shanghai 200050, Peoples R China
  • [ 4 ] [Feng, Songlin]Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Lab Nanotechnol, Shanghai 200050, Peoples R China
  • [ 5 ] [Cheng, Yan]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100022, Peoples R China
  • [ 6 ] [Han, Xiaodong]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100022, Peoples R China
  • [ 7 ] [Zhang, Ze]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100022, Peoples R China
  • [ 8 ] [Zhang, Ting]Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China
  • [ 9 ] [Chen, Bomy]Silicon Storage Technol Inc, Sunnyvale, CA 94086 USA

Reprint Author's Address:

  • [Zhang, Ting]Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Lab Nanotechnol, Shanghai 200050, Peoples R China

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Source :

SCRIPTA MATERIALIA

ISSN: 1359-6462

Year: 2008

Issue: 11

Volume: 58

Page: 977-980

6 . 0 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 16

SCOPUS Cited Count: 17

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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