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Abstract:
介绍了一种基于MEMS技术的新型室温中远红外波段硅基电容式红外探测器原理和制作工艺过程,并详细介绍了针对单面光刻机而采用的对准孔双面对准和键合对准技术、浓硼扩散EPW腐蚀停止技术制备超薄敏感硅膜以及薄膜的疏水处理等关键工艺.还对各环节所遇到的问题和其相应的解决方法进行了详细地阐述.
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仪表技术与传感器
ISSN: 1002-1841
Year: 2004
Issue: 4
Page: 3-4
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count: 2
Chinese Cited Count:
30 Days PV: 5
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