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Abstract:
运用Si/Ti/Au/Au/Ti/Si在N2保护下及420 ℃左右,成功地实现了Au/Si共熔键合,成品率达到90%以上.该键合方法能进行选择区域键合,完全避免了由于Si/Si熔融键合过程中高温退火给微电子机械系统(MEMS)器件带来的畸变甚至失效,为新型室温红外探测器的研制奠定了良好的工艺基础,是此类结构MEMS器件的理想键合封装方法.
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光电子·激光
ISSN: 1005-0086
Year: 2004
Issue: 7
Volume: 15
Page: 839-841
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count: 17
Chinese Cited Count:
30 Days PV: 3
Affiliated Colleges: