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Author:

Ye, Tongyang (Ye, Tongyang.) | Hou, Ligang (Hou, Ligang.) | Zhang, Shier (Zhang, Shier.) | Wang, Jinhui (Wang, Jinhui.) | Peng, Xiaohong (Peng, Xiaohong.)

Indexed by:

CPCI-S

Abstract:

In three-dimensional integrated circuit, model's establishment can help us to design the chip and analyze its performance effectively. In previous studies, most modelling was based on a single physical field, which could not completely simulate the actual working environment of the chip. In this paper, we establish a TSV model in 3D IC thermoelectric simulation. Modelling is based on the multi physical field coupling and uses COMSOL software to create a more realistic work scenario for the chip. By establishing the model and setting the boundary conditions, we studied the thermal distribution and electrical distribution of the chip. Finally we discussed several factors influencing the thermal distribution of the chip.

Keyword:

TSV modelling thermoelectric simulation

Author Community:

  • [ 1 ] [Ye, Tongyang]Beijing Univ Technol, VLSI & Syst Lab, Beijing 100124, Peoples R China
  • [ 2 ] [Hou, Ligang]Beijing Univ Technol, VLSI & Syst Lab, Beijing 100124, Peoples R China
  • [ 3 ] [Zhang, Shier]Beijing Univ Technol, VLSI & Syst Lab, Beijing 100124, Peoples R China
  • [ 4 ] [Peng, Xiaohong]Beijing Univ Technol, VLSI & Syst Lab, Beijing 100124, Peoples R China
  • [ 5 ] [Wang, Jinhui]North Dakota State Univ, Dept Elect & Comp Engn, Fargo, ND 58102 USA

Reprint Author's Address:

  • [Hou, Ligang]Beijing Univ Technol, VLSI & Syst Lab, Beijing 100124, Peoples R China

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Source :

2017 IEEE 12TH INTERNATIONAL CONFERENCE ON ASIC (ASICON)

ISSN: 2162-7541

Year: 2017

Page: 678-681

Language: English

Cited Count:

WoS CC Cited Count: 3

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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