Abstract:
用全息法在光致抗蚀剂涂层上制作光栅,涉及到所用的激光光源、干涉仪系统和光敏记录介质。在现有条件下,对一个刻划面积约80×40mm~2的光栅,可以得到波前象差1/6λ,30%的衍射效率,分辨率为理论值的75%和无鬼线强度。
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Source :
北京工业大学学报
Year: 1980
Issue: 01
Page: 63-68
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 3
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