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Author:

徐敏 (徐敏.) | 郑基立 (郑基立.) | 郭厚林 (郭厚林.)

Abstract:

用全息法在光致抗蚀剂涂层上制作光栅,涉及到所用的激光光源、干涉仪系统和光敏记录介质。在现有条件下,对一个刻划面积约80×40mm~2的光栅,可以得到波前象差1/6λ,30%的衍射效率,分辨率为理论值的75%和无鬼线强度。

Keyword:

干涉仪系统 激光器 光谱学 全息法 光刻胶

Author Community:

  • [ 1 ] 北京工业大学
  • [ 2 ] 北京光学仪器厂

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Source :

北京工业大学学报

Year: 1980

Issue: 01

Page: 63-68

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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