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Author:

Wu, Yue (Wu, Yue.) | Jiang, Guangyu (Jiang, Guangyu.) | Zhu, Jiamin (Zhu, Jiamin.) | Wu, Donghong (Wu, Donghong.) | Quan, Xueling (Quan, Xueling.) | Shi, Jiangtao (Shi, Jiangtao.) | Suo, Hongli (Suo, Hongli.) (Scholars:索红莉) | Zhao, Yue (Zhao, Yue.) (Scholars:赵艳)

Indexed by:

EI Scopus SCIE

Abstract:

Ultra-fast growth (up to 100 nm s(-1)) of high temperature superconducting film was demonstrated by using an advanced pulsed laser deposition technique. Highly textured EuBa2Cu3O7-delta (EuBCO) film with 8 mol.% of BaHfO3 (BHO) was deposited on the IBAD-based Hastelloy substrates. Structure characterizations reveal formation of high density of BHO nanocolumns with diameter of similar to 5 nm in the film, which is well beyond the expectation. Comparison study on different amount of BHO in EBCO film confirmed that nanocolumn formation strongly depends on the dopant level. The epitaxial growth process of BHO is dominated by ultra-fast self-assembly associated with enhanced diffusion of high flux element and liquid phase. Due to the correlated pinning landscape, a pronounced broad peak appears at B//c in the J(c)() curves at 30 K 5 T, while a strong pinning force of about 900 GN m(-3) at 4.2 K, 10 T (B//c) are achieved.

Keyword:

pulse laser deposition diffusion defect engineering high-temperature superconductor

Author Community:

  • [ 1 ] [Wu, Yue]Shanghai Jiao Tong Univ, Sch Elect Informat & Elect Engn, Shanghai 200240, Peoples R China
  • [ 2 ] [Zhu, Jiamin]Shanghai Jiao Tong Univ, Sch Elect Informat & Elect Engn, Shanghai 200240, Peoples R China
  • [ 3 ] [Shi, Jiangtao]Shanghai Jiao Tong Univ, Sch Elect Informat & Elect Engn, Shanghai 200240, Peoples R China
  • [ 4 ] [Zhao, Yue]Shanghai Jiao Tong Univ, Sch Elect Informat & Elect Engn, Shanghai 200240, Peoples R China
  • [ 5 ] [Jiang, Guangyu]Shanghai Superconductor Technol Co Ltd, Shanghai 201203, Peoples R China
  • [ 6 ] [Zhu, Jiamin]Shanghai Superconductor Technol Co Ltd, Shanghai 201203, Peoples R China
  • [ 7 ] [Wu, Donghong]Shanghai Superconductor Technol Co Ltd, Shanghai 201203, Peoples R China
  • [ 8 ] [Zhao, Yue]Shanghai Superconductor Technol Co Ltd, Shanghai 201203, Peoples R China
  • [ 9 ] [Quan, Xueling]Shanghai Jiao Tong Univ, Ctr Adv Elect Mat & Devices, Shanghai 200240, Peoples R China
  • [ 10 ] [Suo, Hongli]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100022, Peoples R China

Reprint Author's Address:

  • 赵艳

    [Zhao, Yue]Shanghai Jiao Tong Univ, Sch Elect Informat & Elect Engn, Shanghai 200240, Peoples R China;;[Zhao, Yue]Shanghai Superconductor Technol Co Ltd, Shanghai 201203, Peoples R China

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Source :

SUPERCONDUCTOR SCIENCE & TECHNOLOGY

ISSN: 0953-2048

Year: 2021

Issue: 5

Volume: 34

3 . 6 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:72

JCR Journal Grade:2

Cited Count:

WoS CC Cited Count: 11

SCOPUS Cited Count: 11

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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