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Author:

Jabar, Bushra (Jabar, Bushra.) | Mansoor, Adil (Mansoor, Adil.) | Chen, Yue-xing (Chen, Yue-xing.) | Jamil, Sidra (Jamil, Sidra.) | Chen, Shuo (Chen, Shuo.) | Liang, Guang-xing (Liang, Guang-xing.) | Li, Fu (Li, Fu.) | Fan, Ping (Fan, Ping.) | Zheng, Zhuang-hao (Zheng, Zhuang-hao.)

Indexed by:

EI Scopus SCIE

Abstract:

The interplay between minority and majority carriers in a narrow bandgap semiconductor can benefit their thermoelectric performance. Herein, the optimistic infiuence of in-situ nanocompositing in adjusting the balance between majority and minority carriers for the p-type BixSb2-xTe3 thermoelectric (TE) material is reported. A two-fold strategy of grain refinement via optimized heat treatment and nanocompositing via nanosized Te addition for BixSb2-xTe3 is explored. In the present homo-structural nanocomposite system, enhancement in power factor (PF) is benefited from the synergistic improvement in electrical conductivity (sigma) and the Seebeck coefficient (S). Further, experimental and theoretical work illustrates that adjusting the antisite defects formation enlarges the bandgap and fiattens the valence band edge, thereby increasing the Seebeck coefficient. Conse-quently, a high maximum figure of merit ZTmax of 1.46 is realized at operative temperature T similar to 370 K (with Te content y = 4.0 wt%). These findings highlight the optimization of the heating process and the effectiveness of the optimal in-situ nanocompositing that can play a significant role in developing atomistic doping-induced nanocompositing based TE systems.

Keyword:

Figure of merit Thermoelectric material BixSb2-xTe3 alloy Spark plasma sintering Power factor

Author Community:

  • [ 1 ] [Jabar, Bushra]Shenzhen Univ, Coll Phys & Optoelect Engn, Shenzhen Key Lab Adv Thin Films & Applicat, Key Lab Optoelect Devices & Syst,Minist Educ & Gu, Shenzhen 518060, Peoples R China
  • [ 2 ] [Chen, Yue-xing]Shenzhen Univ, Coll Phys & Optoelect Engn, Shenzhen Key Lab Adv Thin Films & Applicat, Key Lab Optoelect Devices & Syst,Minist Educ & Gu, Shenzhen 518060, Peoples R China
  • [ 3 ] [Chen, Shuo]Shenzhen Univ, Coll Phys & Optoelect Engn, Shenzhen Key Lab Adv Thin Films & Applicat, Key Lab Optoelect Devices & Syst,Minist Educ & Gu, Shenzhen 518060, Peoples R China
  • [ 4 ] [Liang, Guang-xing]Shenzhen Univ, Coll Phys & Optoelect Engn, Shenzhen Key Lab Adv Thin Films & Applicat, Key Lab Optoelect Devices & Syst,Minist Educ & Gu, Shenzhen 518060, Peoples R China
  • [ 5 ] [Li, Fu]Shenzhen Univ, Coll Phys & Optoelect Engn, Shenzhen Key Lab Adv Thin Films & Applicat, Key Lab Optoelect Devices & Syst,Minist Educ & Gu, Shenzhen 518060, Peoples R China
  • [ 6 ] [Fan, Ping]Shenzhen Univ, Coll Phys & Optoelect Engn, Shenzhen Key Lab Adv Thin Films & Applicat, Key Lab Optoelect Devices & Syst,Minist Educ & Gu, Shenzhen 518060, Peoples R China
  • [ 7 ] [Zheng, Zhuang-hao]Shenzhen Univ, Coll Phys & Optoelect Engn, Shenzhen Key Lab Adv Thin Films & Applicat, Key Lab Optoelect Devices & Syst,Minist Educ & Gu, Shenzhen 518060, Peoples R China
  • [ 8 ] [Mansoor, Adil]Beijing Univ Technol, Fac Mat & Mfg, 100 Peenle Yuan, Beijing 100124, Peoples R China
  • [ 9 ] [Jamil, Sidra]Southwest Univ, Sch Mat & Energy, Lab Luminescence Anal & Mol Sensing, Minist Educ, Chongqing 400715, Peoples R China

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Source :

CHEMICAL ENGINEERING JOURNAL

ISSN: 1385-8947

Year: 2022

Volume: 435

1 5 . 1

JCR@2022

1 5 . 1 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:49

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 13

SCOPUS Cited Count: 14

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 5

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