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Author:

Pan, Shijie (Pan, Shijie.) | Feng, Shiwei (Feng, Shiwei.) (Scholars:冯士维) | Li, Xuan (Li, Xuan.) | Bai, Kun (Bai, Kun.) | Lu, Xiaozhuang (Lu, Xiaozhuang.) | Zhu, Jiayu (Zhu, Jiayu.) | Zhang, Yamin (Zhang, Yamin.) | Zhou, Lixing (Zhou, Lixing.)

Indexed by:

EI Scopus SCIE

Abstract:

In this work, the current transient method was conducted for trap analysis in the p-GaN gate high-electron-mobility transistors (HEMTs) in the OFF-state. Based on the traditional detrapping transient measurements, the pure recovery transients can be isolated by subtracting the undetected part caused by the measurement conditions. A comparison of the measured and actual recovery transients under different drain filling voltages was presented. It suggested that this method can be effective to analyze the unregular transient curves and distinguish the charge trapping type preliminarily. In addition, three traps were identified based on the time constant spectra and the hidden absolute amplitudes of traps can be corrected using the differential amplitude spectra. The information of trap levels in the buffer layer and AlGaN barrier layer was revealed, consisting of three electron traps with energy levels of 0.313, 0.265, and 0.467 eV. The identification of the traps may provide a physical foundation for better understanding of the drain-induced trapping effect during the OFF-state in p-GaN HEMTs.

Keyword:

trapping effect Electron traps reliability Current transient method normally-OFF Behavioral sciences HEMTs Logic gates p-GaN gate high-electron-mobility transistors (HEMTs) Market research MODFETs Transient analysis

Author Community:

  • [ 1 ] [Pan, Shijie]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 2 ] [Feng, Shiwei]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 3 ] [Li, Xuan]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 4 ] [Bai, Kun]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 5 ] [Lu, Xiaozhuang]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 6 ] [Zhu, Jiayu]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 7 ] [Zhang, Yamin]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 8 ] [Zhou, Lixing]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China

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Source :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

Year: 2022

Issue: 9

Volume: 69

Page: 4877-4882

3 . 1

JCR@2022

3 . 1 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:49

JCR Journal Grade:2

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 8

SCOPUS Cited Count: 9

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 15

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