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Author:

Dai, Ziruo (Dai, Ziruo.) | Chen, Tao (Chen, Tao.) | Han, Xiao (Han, Xiao.)

Indexed by:

EI Scopus

Abstract:

High quality surface can be quickly obtained by laser polishing quartz glass. With the improvement of application requirements of quartz glass, the combination of process parameters for optimizing CO2 laser polishing large area quartz glass sheet is proposed. The untreated quartz ground glass was scanned by CO2 laser. Taking the roughness as the research index value, the parameters affecting CO2 laser polishing were studied and analyzed. The transient model was established by COMSOL software to simulate the polishing process, predict the combination of polishing parameters, and obtain the temperature field change in the polishing process and the flow of quartz glass during melting. 300W continuous CO2 laser was used in the experiment. The effect of surface improvement was the best when the laser power was 300W, the scanning rate was 100~200mm/s. The micro area roughness can reach Ra=10.18nm. Then, the chemical corrosion was combined with CO2 laser polishing, and the quartz glass was corroded by hydrofluoric acid and sodium hydroxide solution, and then polished to obtain the average minimum roughness Ra=5.63nm. The research results can be put into practical industrial production, which is conducive to improving production efficiency and promote the development of laser polishing quartz glass technology. © 2022 Institute of Physics Publishing. All rights reserved.

Keyword:

Polishing Hydrofluoric acid Industrial research Corrosion Sodium hydroxide Carbon dioxide Glass Quartz

Author Community:

  • [ 1 ] [Dai, Ziruo]Material and Manufactory Department, Beijing University of Technology, Beijing; 100124, China
  • [ 2 ] [Chen, Tao]Material and Manufactory Department, Beijing University of Technology, Beijing; 100124, China
  • [ 3 ] [Han, Xiao]Beijing Space Electromechanical Research Institute, Beijing; 100094, China

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Source :

ISSN: 1742-6588

Year: 2022

Issue: 1

Volume: 2174

Language: English

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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