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Author:

Pan, Shijie (Pan, Shijie.) | Feng, Shiwei (Feng, Shiwei.) (Scholars:冯士维) | Zheng, Xiang (Zheng, Xiang.) | He, Xin (He, Xin.) | Li, Xuan (Li, Xuan.) | Bai, Kun (Bai, Kun.)

Indexed by:

EI Scopus SCIE

Abstract:

In this study, we investigated the effects of temperature and bias voltage on the electron transport properties of AlGaN/GaN high-electron-mobility transistors in the saturation region using a turn-on delay time. A sine wave signal was used to accurately acquire the delay time between the gate-source voltage and drain-source current signal of the device at temperatures ranging from 30 degrees C to 180 degrees C under operating conditions. With this method, we illustrated a non-monotonic relationship between the temperature and the delay time, which was closely related to the effect of temperature on saturation drift velocity and charge trapping. In addition, it suggested that the delay time increased with increasing drain-source voltage, which was ascribed to the effect of charge trapping. The validity of the proposed results has been thoroughly verified with similar phenomena on two samples. The results may be useful for further study on the electron transport of GaN HEMTs under high temperature and voltages.

Keyword:

trapping effect high-electron-mobility transistor (HEMT) turn-on delay gallium nitride (GaN) Electron transport

Author Community:

  • [ 1 ] [Pan, Shijie]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 2 ] [Feng, Shiwei]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 3 ] [Zheng, Xiang]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 4 ] [He, Xin]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 5 ] [Li, Xuan]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 6 ] [Bai, Kun]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China

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Source :

IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY

ISSN: 1530-4388

Year: 2021

Issue: 4

Volume: 21

Page: 494-499

2 . 0 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:87

JCR Journal Grade:3

Cited Count:

WoS CC Cited Count: 5

SCOPUS Cited Count: 6

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 7

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