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Author:

Wang, X. (Wang, X..) | Cui, S. (Cui, S..) | Yang, M. (Yang, M..) | Zhao, L. (Zhao, L..) | Tan, B. (Tan, B..) | Liu, T. (Liu, T..) | Wang, G. (Wang, G..) | Deng, J. (Deng, J..) | Luo, J. (Luo, J..)

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EI Scopus SCIE

Abstract:

The non-collinear antiferromagnetic Weyl semimetal Mn3X (X = Ga, Ge, Sn) system has attracted a lot of attentions owing to its robust anomalous Hall effect (AHE), large spin Hall angle and small net magnetization at room temperature. The high spin-charge interconversion efficiency makes it a super candidate in topological antiferromagnetic spintronic devices, which could facilitate ultra-fast operation of high-density devices with low energy consumption. In this work, we have realized to obtain different chiral spin structures in Heusler alloy Mn3Ge thin films, which originate from different crystalline orientations. The high-quality (0002)- and (20 2 ¯ 0)-oriented single phase hexagonal Mn3Ge films are achieved by controllable growth, annealing process and ion implantation. The various magnetic properties and AHE behaviors are observed along a and c crystal axes, equivalent to magnetic field in and out of the inverse triangular spin plane. The observation demonstrates the manipulation of crystal structure accompanied with chiral spin order in a non-collinear antiferromagnetic Mn3Ge film, which is induced by energy conversion and defect introduction. The in situ thermal treatment induces crystal phase rotation up to 90° and robust AHE modulation, which is significantly important and highly desirable for flexible spin memory device applications. © 2023 IOP Publishing Ltd.

Keyword:

non-collinear chiral structure topological antiferromagnet Heusler alloy Mn3Ge anomalous Hall effect crystal orientation

Author Community:

  • [ 1 ] [Wang X.]Department of Physics and Optoelectronic Engineering, Faculty of Science, Beijing University of Technology, Beijing, 100124, China
  • [ 2 ] [Cui S.]Department of Physics and Optoelectronic Engineering, Faculty of Science, Beijing University of Technology, Beijing, 100124, China
  • [ 3 ] [Yang M.]Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
  • [ 4 ] [Zhao L.]Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
  • [ 5 ] [Tan B.]National Engineering Research Center of Electromagnetic Radiation Control Materials, University of Electronic Science and Technology of China, Chengdu, 610054, China
  • [ 6 ] [Liu T.]National Engineering Research Center of Electromagnetic Radiation Control Materials, University of Electronic Science and Technology of China, Chengdu, 610054, China
  • [ 7 ] [Wang G.]Department of Physics and Optoelectronic Engineering, Faculty of Science, Beijing University of Technology, Beijing, 100124, China
  • [ 8 ] [Deng J.]Department of Physics and Optoelectronic Engineering, Faculty of Science, Beijing University of Technology, Beijing, 100124, China
  • [ 9 ] [Luo J.]Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China

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Source :

Nanotechnology

ISSN: 0957-4484

Year: 2023

Issue: 31

Volume: 34

3 . 5 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:26

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 7

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