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Author:

Tang, Penghao (Tang, Penghao.) | Xiong, Fangzhu (Xiong, Fangzhu.) | Du, Zaifa (Du, Zaifa.) | Li, Kai (Li, Kai.) | Mei, Yu (Mei, Yu.) | Guo, Weiling (Guo, Weiling.) | Yan, Qun (Yan, Qun.) | Sun, Jie (Sun, Jie.)

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EI

Abstract:

This paper reports a metal assisted process for the direct growth of CVD graphene on GaN LED epiwafers. The metal layer was introduced as both the mask and catalyst, which was subsequently removed in a penetration etching process. This provides a solution for the integration of graphene and GaN devices. © 2022 ITE and SID.

Keyword:

Light emitting diodes Graphene III-V semiconductors Transparent electrodes Gallium nitride Etching

Author Community:

  • [ 1 ] [Tang, Penghao]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 2 ] [Xiong, Fangzhu]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 3 ] [Du, Zaifa]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 4 ] [Li, Kai]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 5 ] [Mei, Yu]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 6 ] [Guo, Weiling]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 7 ] [Yan, Qun]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350117, China
  • [ 8 ] [Yan, Qun]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 9 ] [Sun, Jie]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350117, China
  • [ 10 ] [Sun, Jie]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China

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Source :

ISSN: 1883-2490

Year: 2022

Volume: 29

Page: 868-870

Language: English

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 7

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