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Abstract:
This paper reports a metal assisted process for the direct growth of CVD graphene on GaN LED epiwafers. The metal layer was introduced as both the mask and catalyst, which was subsequently removed in a penetration etching process. This provides a solution for the integration of graphene and GaN devices. © 2022 ITE and SID.
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ISSN: 1883-2490
Year: 2022
Volume: 29
Page: 868-870
Language: English
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 7
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