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Author:

Wang, Lihao (Wang, Lihao.) | Jia, Yunpeng (Jia, Yunpeng.) | Zhao, Yuanfu (Zhao, Yuanfu.) | Wang, Liang (Wang, Liang.) | Deng, Zhonghan (Deng, Zhonghan.)

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EI Scopus

Abstract:

In this paper, an experimental characterization of the behavior of commercial 200V/48A Enhancement-mode GaN HEMTs under heavy ion irradiation is presented. The damage caused by SEE may cumulative and permanent, which makes the drain leakage current gradually increase. Regardless of whether SEE occurs, the threshold voltage will shift after heavy ion irradiation. The increase in output capacitance and reverse transfer capacitance means that the AlGaN buffer layer is partially damaged, resulting in an increase in drain leakage current. © 2021 IEEE

Keyword:

III-V semiconductors Drain current Ion bombardment Threshold voltage Semiconductor alloys Buffer layers Leakage currents Aluminum gallium nitride Capacitance High electron mobility transistors Heavy ions Gallium nitride

Author Community:

  • [ 1 ] [Wang, Lihao]Faculty of Information Technology, Beijing University of Technology, Beijing, China
  • [ 2 ] [Jia, Yunpeng]Faculty of Information Technology, Beijing University of Technology, Beijing, China
  • [ 3 ] [Zhao, Yuanfu]Faculty of Information Technology, Beijing University of Technology, Beijing, China
  • [ 4 ] [Zhao, Yuanfu]Beijing Microelectronics Technology Institute, Beijing, China
  • [ 5 ] [Wang, Liang]Beijing Microelectronics Technology Institute, Beijing, China
  • [ 6 ] [Deng, Zhonghan]Faculty of Information Technology, Beijing University of Technology, Beijing, China

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Year: 2021

Language: English

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 3

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 15

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