Surface　engineering　has　made　substantial　advances　in　recent　years,　owing　to　the　demand　for　increased　wetting　qualities　in　a　variety　of　applications.　In　this　study,　we　describe　a　novel　method　for　improving　surface　wettability　by　developing　nanostructured　silicon　nanowires-holes　Si　(NWs-NHs)　arrays.　Two-beam　laser　interference　lithography　(LIL)　was　used　to　make　patterns,　and　metal-assisted　chemical　etching　(MACE)　was　used　to　produce　Si　(NWs-NHs)　arrays.　The　development　of　hydrophobic　Si　nanostructures,　which　exhibit　a　higher　hydrophobicity　than　bare　Si,　also　increased　the　surface　wettability.　Using　a　scanning　electron　microscope　(SEM),　the　surface　shape　and　chemical　composition　of　the　created　nanostructures　were　examined.　Measurements　of　the　contact　angles　were　used　to　describe　the　wettability　properties.　This　study　exemplifies　the　potential　of　LIL　and　MACE　approaches　for　the　creation　of　Si　nanostructures　with　distinctive　features,　which　have　applications　in　self-cleaning　surfaces,　anti-fog　coatings,　microfluidic　devices,　and　air　humidity　control.　©　2023　IEEE.