• Complex
  • Title
  • Keyword
  • Abstract
  • Scholars
  • Journal
  • ISSN
  • Conference
搜索

Author:

Mu, Y.W. (Mu, Y.W..) | Dong, H.L. (Dong, H.L..) | Jia, Z.G. (Jia, Z.G..) | Jia, W. (Jia, W..) | Liang, J. (Liang, J..) | Wang, Z.Y. (Wang, Z.Y..) | Xu, B.S. (Xu, B.S..)

Indexed by:

EI Scopus SCIE

Abstract:

An asymmetric InAlGaN/GaN superlattice barrier structure without the first quantum barrier layer (FQB) is designed, and its effect on the optoelectronic performance of GaN-based green laser diode (LD) has been investigated based on simulation experiment and analytical results. It is found that, compared with conventional GaN barrier LD, device performance is significantly improved by using FQB-free asymmetric InAlGaN/GaN superlattice barrier structure, including low threshold current, high output power, and high photoelectric conversion efficiency. The threshold current of LD with novel structure is 16.19 mA, which is 22.46% less than GaN barrier LD. Meanwhile, the output power is 110.69 mW at an injection current of 120 mA, which is 16.20% higher compared to conventional LD, and the wall-plug efficiency has an enhancement of 9.5%, reaching 20.27%. FQB-free asymmetric InAlGaN/GaN superlattice barrier layer can reduce optical loss, suppress the polarization effect, and improve the carrier injection efficiency, which is beneficial to improve output power and photoelectric conversion efficiency. The novel epitaxial structure provides theoretical guidance and data support for improving the optoelectronic performance of GaN-based green LD. © 2024 The Electrochemical Society (“ECS”). Published on behalf of ECS by IOP Publishing Limited.

Keyword:

GaN-based laser diode optoelectronic performance asymmetric InAlGaN/GaN superlattice barrier laser

Author Community:

  • [ 1 ] [Mu Y.W.]Key Laboratory of Interface Science and Engineering in Advanced Materials Ministry of Education, Taiyuan University of Technology, Taiyuan, 030024, China
  • [ 2 ] [Dong H.L.]Key Laboratory of Interface Science and Engineering in Advanced Materials Ministry of Education, Taiyuan University of Technology, Taiyuan, 030024, China
  • [ 3 ] [Dong H.L.]Shanxi-Zheda Institute of Advanced Materials and Chemical Engineering, Shanxi, Taiyuan, 030024, China
  • [ 4 ] [Jia Z.G.]Key Laboratory of Interface Science and Engineering in Advanced Materials Ministry of Education, Taiyuan University of Technology, Taiyuan, 030024, China
  • [ 5 ] [Jia W.]Key Laboratory of Interface Science and Engineering in Advanced Materials Ministry of Education, Taiyuan University of Technology, Taiyuan, 030024, China
  • [ 6 ] [Jia W.]Shanxi-Zheda Institute of Advanced Materials and Chemical Engineering, Shanxi, Taiyuan, 030024, China
  • [ 7 ] [Liang J.]College of Materials Science and Engineering, Taiyuan University of Technology, Taiyuan, 030024, China
  • [ 8 ] [Wang Z.Y.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 9 ] [Xu B.S.]Key Laboratory of Interface Science and Engineering in Advanced Materials Ministry of Education, Taiyuan University of Technology, Taiyuan, 030024, China
  • [ 10 ] [Xu B.S.]Shanxi-Zheda Institute of Advanced Materials and Chemical Engineering, Shanxi, Taiyuan, 030024, China
  • [ 11 ] [Xu B.S.]Institute of Atomic and Molecular Science, Shaanxi University of Science & Technology, Xian, 710021, China

Reprint Author's Address:

Email:

Show more details

Related Keywords:

Source :

ECS Journal of Solid State Science and Technology

ISSN: 2162-8769

Year: 2024

Issue: 5

Volume: 13

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

Affiliated Colleges:

Online/Total:348/10642721
Address:BJUT Library(100 Pingleyuan,Chaoyang District,Beijing 100124, China Post Code:100124) Contact Us:010-67392185
Copyright:BJUT Library Technical Support:Beijing Aegean Software Co., Ltd.